@inproceedings{93c60625826841e588512b6c275c7791,
title = "Uniform metal-assisted chemical etching and the stability of catalysts",
abstract = "Recently, metal-assisted chemical etching (MaCE) has been demonstrated as a promising technology in fabrication of uniform high-aspect-ratio (HAR) micro- and nanostructures on silicon substrates. In this work, MaCE experiments on 2 um-wide line patterns were conducted using Au or Ag as catalysts. The performance of the two catalysts show sharp contrast. In MaCE with Au, a HAR trench was formed with uniform geometry and vertical sidewall. In MaCE with Ag, shallow and tapered etching profiles were observed, which resembled the results from isotropic etching. The sidewall tapering phenomena can be explained by the dissolution and re-deposition of the Ag catalyst in the etchant solution. The existence of Ag that was redeposited on the sidewall was further confirmed by energy dispersive spectrum. Also, etchant composition is found to play a profound role in influencing the etching profile by the Ag catalysts.",
author = "Liyi Li and Holmes, {Colin M.} and Jinho Hah and Hildreth, {Owen J.} and Wong, {Ching P.}",
note = "Publisher Copyright: {\textcopyright} 2015 Materials Research Society.; 2015 MRS Spring Meeting ; Conference date: 06-04-2015 Through 10-04-2015",
year = "2015",
doi = "10.1557/opl.2015.574",
language = "English (US)",
series = "Materials Research Society Symposium Proceedings",
publisher = "Materials Research Society",
pages = "1--8",
editor = "Konrad Rykaczewski and Xiuling Li and Zhipeng Huang and Owen Hildreth",
booktitle = "Metal-Assisted Chemical Etching of Silicon and Other Semiconductors",
}