Ultrathin cobalt silicide layers formed by rapid thermal processing of metal on amorphous silicon

Engineering & Materials Science

• Rapid thermal processing 100%
• Silicides 85%
• Amorphous silicon 85%
• Cobalt 72%
• Metals 40%
• Single electron transistors 33%
• Auger electron spectroscopy 32%
• Rapid thermal annealing 32%
• Sheet resistance 28%
• Surface analysis 26%
• Temperature 25%
• Polysilicon 24%
• Transmission electron microscopy 21%
• Annealing 20%
• Statistical methods 17%
• Fabrication 15%

Physics & Astronomy

• silicides 65%
• cobalt 58%
• amorphous silicon 57%
• ramps 45%
• metals 32%
• single electron transistors 27%
• annealing 25%
• metal films 21%
• statistical analysis 21%
• Auger spectroscopy 20%
• electron spectroscopy 20%
• temperature 18%
• optimization 13%
• transmission electron microscopy 13%
• fabrication 12%