Ultrafast recombination and trapping in amorphous silicon

A. Esser, K. Seibert, H. Kurz, G. N. Parsons, C. Wang, B. N. Davidson, G. Lucovsky, Robert Nemanich

Research output: Contribution to journalArticle

20 Citations (Scopus)

Abstract

We have studied time-resolved reflectivity changes induced by femtosecond laser pulses in a-Si and a-Si:H thin-films. By varying pump-power, we have identified a non-radiative recombination process which controls the free-carrier density, N, on a picosecond time scale for N>5 ×1018cm-3 in a-Si:H and >5×1019 cm-3 in a-Si. At lower carrier densities, transients are controlled by trapping of free-carriers.

Original languageEnglish (US)
Pages (from-to)573-575
Number of pages3
JournalJournal of Non-Crystalline Solids
Volume114
Issue numberPART 2
DOIs
StatePublished - Dec 2 1989
Externally publishedYes

Fingerprint

Amorphous silicon
amorphous silicon
Carrier concentration
trapping
Ultrashort pulses
Process control
Pumps
pumps
reflectance
Thin films
thin films
pulses
lasers

ASJC Scopus subject areas

  • Ceramics and Composites
  • Electronic, Optical and Magnetic Materials

Cite this

Esser, A., Seibert, K., Kurz, H., Parsons, G. N., Wang, C., Davidson, B. N., ... Nemanich, R. (1989). Ultrafast recombination and trapping in amorphous silicon. Journal of Non-Crystalline Solids, 114(PART 2), 573-575. https://doi.org/10.1016/0022-3093(89)90654-6

Ultrafast recombination and trapping in amorphous silicon. / Esser, A.; Seibert, K.; Kurz, H.; Parsons, G. N.; Wang, C.; Davidson, B. N.; Lucovsky, G.; Nemanich, Robert.

In: Journal of Non-Crystalline Solids, Vol. 114, No. PART 2, 02.12.1989, p. 573-575.

Research output: Contribution to journalArticle

Esser, A, Seibert, K, Kurz, H, Parsons, GN, Wang, C, Davidson, BN, Lucovsky, G & Nemanich, R 1989, 'Ultrafast recombination and trapping in amorphous silicon', Journal of Non-Crystalline Solids, vol. 114, no. PART 2, pp. 573-575. https://doi.org/10.1016/0022-3093(89)90654-6
Esser A, Seibert K, Kurz H, Parsons GN, Wang C, Davidson BN et al. Ultrafast recombination and trapping in amorphous silicon. Journal of Non-Crystalline Solids. 1989 Dec 2;114(PART 2):573-575. https://doi.org/10.1016/0022-3093(89)90654-6
Esser, A. ; Seibert, K. ; Kurz, H. ; Parsons, G. N. ; Wang, C. ; Davidson, B. N. ; Lucovsky, G. ; Nemanich, Robert. / Ultrafast recombination and trapping in amorphous silicon. In: Journal of Non-Crystalline Solids. 1989 ; Vol. 114, No. PART 2. pp. 573-575.
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