Two-dimensional low pass filter model for die-level topography variation resulting from chemical mechanical polishing of ILD films

Tat Kwan Yu, Sejal Chheda, Judy Ko, Mark Roberton, Enis Dengi, Ed Travis

Research output: Contribution to journalConference article

11 Citations (Scopus)

Abstract

This paper presents a new two-dimensional (2-D) low pass filter model for the prediction of post- chemical-mechanical polishing (CMP) die level wafer topography variation caused by the interconnect metal density of a circuit layout. It is demonstrated that the local smoothing and planarization effects of an ILD polishing process can be characterized accurately (in the frequency domain) by a polynomial equation with a small number of fitted parameters. In this method, the design specific metal density patterns with millions of shapes are first captured in the frequency domain using a 2-D Fast Fourier Transform (FFT). A fitted low pass filter CMP model is then applied to filter/remove short range pattern variation. (Die level topography variations are not removed by CMP effectively). Finally, the post-CMP smoothed topography in the spatial domain is computed from inverse FFT. Model predictions and experimental data are compared in three examples a) a test structure, b) a die with shallow trench isolation c) cumulative topography of a die after ILD1, ILD2 and ILD3 polishing.

Original languageEnglish (US)
Pages (from-to)909-912
Number of pages4
JournalTechnical Digest - International Electron Devices Meeting
StatePublished - Dec 1 1999
Externally publishedYes
Event1999 IEEE International Devices Meeting (IEDM) - Washington, DC, USA
Duration: Dec 5 1999Dec 8 1999

Fingerprint

Chemical mechanical polishing
low pass filters
Low pass filters
polishing
Topography
topography
Polishing
Fast Fourier transforms
Metals
Integrated circuit layout
Polynomials
predictions
smoothing
layouts
metals
isolation
polynomials
wafers
filters

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

Cite this

Two-dimensional low pass filter model for die-level topography variation resulting from chemical mechanical polishing of ILD films. / Yu, Tat Kwan; Chheda, Sejal; Ko, Judy; Roberton, Mark; Dengi, Enis; Travis, Ed.

In: Technical Digest - International Electron Devices Meeting, 01.12.1999, p. 909-912.

Research output: Contribution to journalConference article

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AU - Dengi, Enis

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