Abstract

In this work, we demonstrate that the permeability of 1 μm thick NiFe/Cr multilayer films can be tuned by varying the thickness of individual NiFe layers while keeping the total multilayer film thickness constant. Our results show that the permeability can be increased from 170 to 650 by varying the NiFe thicknesses from 100 to 50 nm. The thickness dependant permeability variation was attributed to the presence of stripe domains, as examined by hysteresis measurements and magnetic force microscope imaging. Films with thinner NiFe layers coupled with on-chip spiral inductors enable an inductance increase by a factor of 6.

Original languageEnglish (US)
Article number162506
JournalApplied Physics Letters
Volume97
Issue number16
DOIs
StatePublished - Oct 18 2010

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Permalloys (trademark)
inductors
permeability
chips
tuning
inductance
film thickness
hysteresis
microscopes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Tuning the permeability of permalloy films for on-chip inductor applications. / Dastagir, Tawab; Xu, Wei; Sinha, Saurabh; Wu, Hao; Cao, Yu; Yu, Hongbin.

In: Applied Physics Letters, Vol. 97, No. 16, 162506, 18.10.2010.

Research output: Contribution to journalArticle

Dastagir, Tawab ; Xu, Wei ; Sinha, Saurabh ; Wu, Hao ; Cao, Yu ; Yu, Hongbin. / Tuning the permeability of permalloy films for on-chip inductor applications. In: Applied Physics Letters. 2010 ; Vol. 97, No. 16.
@article{fab6f8574d854859b4178827e2d4bbac,
title = "Tuning the permeability of permalloy films for on-chip inductor applications",
abstract = "In this work, we demonstrate that the permeability of 1 μm thick NiFe/Cr multilayer films can be tuned by varying the thickness of individual NiFe layers while keeping the total multilayer film thickness constant. Our results show that the permeability can be increased from 170 to 650 by varying the NiFe thicknesses from 100 to 50 nm. The thickness dependant permeability variation was attributed to the presence of stripe domains, as examined by hysteresis measurements and magnetic force microscope imaging. Films with thinner NiFe layers coupled with on-chip spiral inductors enable an inductance increase by a factor of 6.",
author = "Tawab Dastagir and Wei Xu and Saurabh Sinha and Hao Wu and Yu Cao and Hongbin Yu",
year = "2010",
month = "10",
day = "18",
doi = "10.1063/1.3502478",
language = "English (US)",
volume = "97",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics Publising LLC",
number = "16",

}

TY - JOUR

T1 - Tuning the permeability of permalloy films for on-chip inductor applications

AU - Dastagir, Tawab

AU - Xu, Wei

AU - Sinha, Saurabh

AU - Wu, Hao

AU - Cao, Yu

AU - Yu, Hongbin

PY - 2010/10/18

Y1 - 2010/10/18

N2 - In this work, we demonstrate that the permeability of 1 μm thick NiFe/Cr multilayer films can be tuned by varying the thickness of individual NiFe layers while keeping the total multilayer film thickness constant. Our results show that the permeability can be increased from 170 to 650 by varying the NiFe thicknesses from 100 to 50 nm. The thickness dependant permeability variation was attributed to the presence of stripe domains, as examined by hysteresis measurements and magnetic force microscope imaging. Films with thinner NiFe layers coupled with on-chip spiral inductors enable an inductance increase by a factor of 6.

AB - In this work, we demonstrate that the permeability of 1 μm thick NiFe/Cr multilayer films can be tuned by varying the thickness of individual NiFe layers while keeping the total multilayer film thickness constant. Our results show that the permeability can be increased from 170 to 650 by varying the NiFe thicknesses from 100 to 50 nm. The thickness dependant permeability variation was attributed to the presence of stripe domains, as examined by hysteresis measurements and magnetic force microscope imaging. Films with thinner NiFe layers coupled with on-chip spiral inductors enable an inductance increase by a factor of 6.

UR - http://www.scopus.com/inward/record.url?scp=77958468407&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77958468407&partnerID=8YFLogxK

U2 - 10.1063/1.3502478

DO - 10.1063/1.3502478

M3 - Article

VL - 97

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 16

M1 - 162506

ER -