Treatment of interface roughness in SOI-MESFETs

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

The effect of interface roughness on the operation of n-channel SOI MESFET device structure was investigated. The ensemble Monte Carlo (EMC) technique used was based upon the usual silicon band structure for three-dimensional electrons in three equivalent valleys. The Monte Carlo transport kernel gave the charge distribution in the device, and the successive over relaxation (SOR) method had been used for the solution of the 2D Poisson equation. The results suggests that the enhanced mobility in the device structure is expected to be in higher MESFET cut-off frequencies with application in rf micropower circuit design.

Original languageEnglish (US)
Pages (from-to)2110-2112
Number of pages3
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume22
Issue number4
DOIs
StatePublished - Jul 2004

Fingerprint

MESFET devices
Charge distribution
Poisson equation
SOI (semiconductors)
Cutoff frequency
Band structure
roughness
field effect transistors
Surface roughness
Silicon
Electrons
Networks (circuits)
charge distribution
valleys
cut-off
silicon
electrons

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Surfaces and Interfaces
  • Physics and Astronomy (miscellaneous)

Cite this

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abstract = "The effect of interface roughness on the operation of n-channel SOI MESFET device structure was investigated. The ensemble Monte Carlo (EMC) technique used was based upon the usual silicon band structure for three-dimensional electrons in three equivalent valleys. The Monte Carlo transport kernel gave the charge distribution in the device, and the successive over relaxation (SOR) method had been used for the solution of the 2D Poisson equation. The results suggests that the enhanced mobility in the device structure is expected to be in higher MESFET cut-off frequencies with application in rf micropower circuit design.",
author = "T. Khan and Dragica Vasileska and Trevor Thornton",
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AU - Khan, T.

AU - Vasileska, Dragica

AU - Thornton, Trevor

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AB - The effect of interface roughness on the operation of n-channel SOI MESFET device structure was investigated. The ensemble Monte Carlo (EMC) technique used was based upon the usual silicon band structure for three-dimensional electrons in three equivalent valleys. The Monte Carlo transport kernel gave the charge distribution in the device, and the successive over relaxation (SOR) method had been used for the solution of the 2D Poisson equation. The results suggests that the enhanced mobility in the device structure is expected to be in higher MESFET cut-off frequencies with application in rf micropower circuit design.

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