Towards quantitative electron holography of magnetic thin films using in situ magnetization reversal

R. E. Dunin-Borkowski, Martha McCartney, David Smith, S. S P Parkin

Research output: Contribution to journalArticle

71 Citations (Scopus)

Abstract

An approach based on off-axis electron holography has been developed for quantifying the magnetization in a sample of unknown local thickness with lateral variations in composition. The magnetic field of the objective lens is used to reverse the magnetization direction in the sample without altering its magnitude, thereby enabling phase changes due to magnetization to be separated from those due to thickness and compositional variations. The technique is demonstrated in applications to a lithographically patterned magnetic film on a silicon nitride membrane and a cross-sectional sample containing a magnetic tunnel junction. The importance of dynamical diffraction effects and fringing fields is discussed.

Original languageEnglish (US)
Pages (from-to)61-73
Number of pages13
JournalUltramicroscopy
Volume74
Issue number1-2
DOIs
StatePublished - Jul 1 1998

Fingerprint

Electron holography
Magnetic thin films
Magnetization reversal
holography
Magnetization
magnetization
thin films
Magnetic films
electrons
Tunnel junctions
magnetic films
Silicon nitride
silicon nitrides
tunnel junctions
Lenses
Diffraction
lenses
Magnetic fields
membranes
Membranes

Keywords

  • In situ magnetization reversal
  • Magnetic thin films
  • Off-axis electron halography

ASJC Scopus subject areas

  • Materials Science(all)
  • Instrumentation

Cite this

Towards quantitative electron holography of magnetic thin films using in situ magnetization reversal. / Dunin-Borkowski, R. E.; McCartney, Martha; Smith, David; Parkin, S. S P.

In: Ultramicroscopy, Vol. 74, No. 1-2, 01.07.1998, p. 61-73.

Research output: Contribution to journalArticle

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