Towards quantitative electron holography of magnetic thin films using in situ magnetization reversal

R. E. Dunin-Borkowski; Martha McCartney; David Smith; S. S P Parkin

doi:10.1016/S0304-3991(98)00023-0

Towards quantitative electron holography of magnetic thin films using in situ magnetization reversal

R. E. Dunin-Borkowski, Martha McCartney, David Smith, S. S P Parkin

Electrical Engineering

Research output: Contribution to journal › Article › peer-review

83 Scopus citations

Abstract

An approach based on off-axis electron holography has been developed for quantifying the magnetization in a sample of unknown local thickness with lateral variations in composition. The magnetic field of the objective lens is used to reverse the magnetization direction in the sample without altering its magnitude, thereby enabling phase changes due to magnetization to be separated from those due to thickness and compositional variations. The technique is demonstrated in applications to a lithographically patterned magnetic film on a silicon nitride membrane and a cross-sectional sample containing a magnetic tunnel junction. The importance of dynamical diffraction effects and fringing fields is discussed.

Original language	English (US)
Pages (from-to)	61-73
Number of pages	13
Journal	Ultramicroscopy
Volume	74
Issue number	1-2
DOIs	https://doi.org/10.1016/S0304-3991(98)00023-0
State	Published - Jul 1 1998

Keywords

In situ magnetization reversal
Magnetic thin films
Off-axis electron halography

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Instrumentation

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10.1016/S0304-3991(98)00023-0

Cite this

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title = "Towards quantitative electron holography of magnetic thin films using in situ magnetization reversal",

abstract = "An approach based on off-axis electron holography has been developed for quantifying the magnetization in a sample of unknown local thickness with lateral variations in composition. The magnetic field of the objective lens is used to reverse the magnetization direction in the sample without altering its magnitude, thereby enabling phase changes due to magnetization to be separated from those due to thickness and compositional variations. The technique is demonstrated in applications to a lithographically patterned magnetic film on a silicon nitride membrane and a cross-sectional sample containing a magnetic tunnel junction. The importance of dynamical diffraction effects and fringing fields is discussed.",

keywords = "In situ magnetization reversal, Magnetic thin films, Off-axis electron halography",

author = "Dunin-Borkowski, {R. E.} and Martha McCartney and David Smith and Parkin, {S. S P}",

note = "Funding Information: The authors are grateful to Dr. B. Kardynal for lithographic patterning of the cobalt sample. This work was partially supported by an IBM sub-contract on the DARPA Advanced MRAM Project and Contract No. MDA-972-96C-0014.",

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AU - Dunin-Borkowski, R. E.

AU - McCartney, Martha

AU - Smith, David

AU - Parkin, S. S P

N1 - Funding Information: The authors are grateful to Dr. B. Kardynal for lithographic patterning of the cobalt sample. This work was partially supported by an IBM sub-contract on the DARPA Advanced MRAM Project and Contract No. MDA-972-96C-0014.

PY - 1998/7/1

Y1 - 1998/7/1

N2 - An approach based on off-axis electron holography has been developed for quantifying the magnetization in a sample of unknown local thickness with lateral variations in composition. The magnetic field of the objective lens is used to reverse the magnetization direction in the sample without altering its magnitude, thereby enabling phase changes due to magnetization to be separated from those due to thickness and compositional variations. The technique is demonstrated in applications to a lithographically patterned magnetic film on a silicon nitride membrane and a cross-sectional sample containing a magnetic tunnel junction. The importance of dynamical diffraction effects and fringing fields is discussed.

AB - An approach based on off-axis electron holography has been developed for quantifying the magnetization in a sample of unknown local thickness with lateral variations in composition. The magnetic field of the objective lens is used to reverse the magnetization direction in the sample without altering its magnitude, thereby enabling phase changes due to magnetization to be separated from those due to thickness and compositional variations. The technique is demonstrated in applications to a lithographically patterned magnetic film on a silicon nitride membrane and a cross-sectional sample containing a magnetic tunnel junction. The importance of dynamical diffraction effects and fringing fields is discussed.

KW - In situ magnetization reversal

KW - Magnetic thin films

KW - Off-axis electron halography

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Towards quantitative electron holography of magnetic thin films using in situ magnetization reversal

Abstract

Keywords

ASJC Scopus subject areas

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