Toward in situ x-ray diffraction imaging at the nanometer scale

Nadia A. Zatsepin, Ruben A. Dilanian, Andrei Y. Nikulin, Brian M. Gable, Barry C. Muddle, Osami Sakata

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

We present the results of preliminary investigations determining the sensitivity and applicability of a novel x-ray diffraction based nanoscale imaging technique, including simulations and experiments. The ultimate aim of this nascent technique is non-destructive, bulk-material characterization on the nanometer scale, involving three dimensional image reconstructions of embedded nanoparticles and in situ sample characterization. The approach is insensitive to x-ray coherence, making it applicable to synchrotron and laboratory hard x-ray sources, opening the possibility of unprecedented nanometer resolution with the latter. The technique is being developed with a focus on analyzing a technologically important light metal alloy, Al-xCu (where x is 2.0-5.0 %wt). The mono- and polycrystalline samples contain crystallographically oriented, weakly diffracting Al2Cu nanoprecipitates in a sparse, spatially random dispersion within the Al matrix. By employing a triple-axis diffractometer in the non-dispersive setup we collected two-dimensional reciprocal space maps of synchrotron x-rays diffracted from the Al2Cu nanoparticles. The intensity profiles of the diffraction peaks confirmed the sensitivity of the technique to the presence and orientation of the nanoparticles. This is a fundamental step towards in situ observation of such extremely sparse, weakly diffracting nanoprecipitates embedded in light metal alloys at early stages of their growth.

Original languageEnglish (US)
Title of host publicationInstrumentation, Metrology, and Standards for Nanomanufacturing II
DOIs
StatePublished - Nov 24 2008
EventInstrumentation, Metrology, and Standards for Nanomanufacturing II - San Diego, CA, United States
Duration: Aug 10 2008Aug 10 2008

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7042
ISSN (Print)0277-786X

Other

OtherInstrumentation, Metrology, and Standards for Nanomanufacturing II
CountryUnited States
CitySan Diego, CA
Period8/10/088/10/08

Keywords

  • Bulk material characterization
  • In situ characterization
  • Nanoscale imaging
  • Non destructive
  • Triple crystal diffractometry
  • X-ray diffractive

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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  • Cite this

    Zatsepin, N. A., Dilanian, R. A., Nikulin, A. Y., Gable, B. M., Muddle, B. C., & Sakata, O. (2008). Toward in situ x-ray diffraction imaging at the nanometer scale. In Instrumentation, Metrology, and Standards for Nanomanufacturing II [70420F] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7042). https://doi.org/10.1117/12.794438