Tio2 DLAR coatings for planar silicon solar cells

B. S. Richards; S. F. Rowlands; C. B. Honsberg; J. E. Cotter

doi:10.1002/pip.474

Tio₂ DLAR coatings for planar silicon solar cells

B. S. Richards, S. F. Rowlands, C. B. Honsberg, J. E. Cotter

Research output: Contribution to journal › Article › peer-review

41 Scopus citations

Abstract

In this paper we demonstrate that a double-layer anti-reflection (DLAR) coating can be fabricated using only titanium dioxide (TiO₂). Two TiO₂ thin films were deposited onto planar silicon wafers using a simple atmospheric pressure chemical vapour deposition (APCVD) system under different deposition conditions. Weighted average reflectances of 6.5% (measured) and 7.0% (calculated) were achieved for TiO₂ DLAR coatings in air and under glass, respectively. An increase in the short-circuit current density of δ J_sc=2.5 mA/cm² can be expected for an optimised TiO₂ DLAR coating when compared with a commercial TiO₂ single-layer anti-reflection coating.

Original language	English (US)
Pages (from-to)	27-32
Number of pages	6
Journal	Progress in Photovoltaics: Research and Applications
Volume	11
Issue number	1
DOIs	https://doi.org/10.1002/pip.474
State	Published - Jan 2003
Externally published	Yes

Keywords

Antireflection coating
DLAR
Double-layer
Multicrystalline
Silicon
Solar cells
TiO
Titanium dioxide

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Renewable Energy, Sustainability and the Environment
Condensed Matter Physics
Electrical and Electronic Engineering

Access to Document

10.1002/pip.474

Cite this

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title = "Tio2 DLAR coatings for planar silicon solar cells",

abstract = "In this paper we demonstrate that a double-layer anti-reflection (DLAR) coating can be fabricated using only titanium dioxide (TiO2). Two TiO2 thin films were deposited onto planar silicon wafers using a simple atmospheric pressure chemical vapour deposition (APCVD) system under different deposition conditions. Weighted average reflectances of 6.5% (measured) and 7.0% (calculated) were achieved for TiO2 DLAR coatings in air and under glass, respectively. An increase in the short-circuit current density of δ Jsc=2.5 mA/cm2 can be expected for an optimised TiO2 DLAR coating when compared with a commercial TiO2 single-layer anti-reflection coating.",

keywords = "Antireflection coating, DLAR, Double-layer, Multicrystalline, Silicon, Solar cells, TiO, Titanium dioxide",

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AU - Richards, B. S.

AU - Rowlands, S. F.

AU - Honsberg, C. B.

AU - Cotter, J. E.

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AB - In this paper we demonstrate that a double-layer anti-reflection (DLAR) coating can be fabricated using only titanium dioxide (TiO2). Two TiO2 thin films were deposited onto planar silicon wafers using a simple atmospheric pressure chemical vapour deposition (APCVD) system under different deposition conditions. Weighted average reflectances of 6.5% (measured) and 7.0% (calculated) were achieved for TiO2 DLAR coatings in air and under glass, respectively. An increase in the short-circuit current density of δ Jsc=2.5 mA/cm2 can be expected for an optimised TiO2 DLAR coating when compared with a commercial TiO2 single-layer anti-reflection coating.

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KW - Solar cells

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