Tio2 DLAR coatings for planar silicon solar cells

B. S. Richards, S. F. Rowlands, C. B. Honsberg, J. E. Cotter

Research output: Contribution to journalArticlepeer-review

36 Scopus citations

Abstract

In this paper we demonstrate that a double-layer anti-reflection (DLAR) coating can be fabricated using only titanium dioxide (TiO2). Two TiO2 thin films were deposited onto planar silicon wafers using a simple atmospheric pressure chemical vapour deposition (APCVD) system under different deposition conditions. Weighted average reflectances of 6.5% (measured) and 7.0% (calculated) were achieved for TiO2 DLAR coatings in air and under glass, respectively. An increase in the short-circuit current density of δ Jsc=2.5 mA/cm2 can be expected for an optimised TiO2 DLAR coating when compared with a commercial TiO2 single-layer anti-reflection coating.

Original languageEnglish (US)
Pages (from-to)27-32
Number of pages6
JournalProgress in Photovoltaics: Research and Applications
Volume11
Issue number1
DOIs
StatePublished - Jan 1 2003
Externally publishedYes

Keywords

  • Antireflection coating
  • DLAR
  • Double-layer
  • Multicrystalline
  • Silicon
  • Solar cells
  • TiO
  • Titanium dioxide

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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