Three-dimensional topography simulation based on a level set method [deposition and etching processes]

A. Sheikholeslami; C. Heitzinger; F. Badrieh; H. Puchner; S. Selberherr

doi:10.1109/ISSE.2004.1490431

Three-dimensional topography simulation based on a level set method [deposition and etching processes]

A. Sheikholeslami, C. Heitzinger, F. Badrieh, H. Puchner, S. Selberherr

Mathematical and Statistical Sciences, School of (SoMSS)

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Scopus citations

Abstract

We present a general 3D topography simulator for the simulation of deposition and etching processes. The simulator is called ELSA (enhanced level set applications). ELSA is based on a level set method including narrow banding and a fast marching method. Modules for the transport of species, for surface reaction, and for the level set method are its basis.

Original language	English (US)
Title of host publication	27th International Spring Seminar on Electronics Technology
Subtitle of host publication	Meeting the Challenges of Electronics Technology Progress, ISSE 2004 - Conference Proceedings
Publisher	IEEE Computer Society
Pages	263-265
Number of pages	3
ISBN (Electronic)	0780384229
DOIs	https://doi.org/10.1109/ISSE.2004.1490431
State	Published - Jan 1 2004
Event	27th International Spring Seminar on Electronics Technology, ISSE 2004 - Bankya, Bulgaria Duration: May 13 2004 → May 16 2004

Publication series

Name	Proceedings of the International Spring Seminar on Electronics Technology
Volume	2
ISSN (Print)	2161-2528
ISSN (Electronic)	2161-2536

Other

Other	27th International Spring Seminar on Electronics Technology, ISSE 2004
Country/Territory	Bulgaria
City	Bankya
Period	5/13/04 → 5/16/04

ASJC Scopus subject areas

Electrical and Electronic Engineering
Safety, Risk, Reliability and Quality

Access to Document

10.1109/ISSE.2004.1490431

Cite this

Sheikholeslami, A., Heitzinger, C., Badrieh, F., Puchner, H., & Selberherr, S. (2004). Three-dimensional topography simulation based on a level set method [deposition and etching processes]. In 27th International Spring Seminar on Electronics Technology: Meeting the Challenges of Electronics Technology Progress, ISSE 2004 - Conference Proceedings (pp. 263-265). Article 1490431 (Proceedings of the International Spring Seminar on Electronics Technology; Vol. 2). IEEE Computer Society. https://doi.org/10.1109/ISSE.2004.1490431

Three-dimensional topography simulation based on a level set method [deposition and etching processes]. / Sheikholeslami, A.; Heitzinger, C.; Badrieh, F. et al.
27th International Spring Seminar on Electronics Technology: Meeting the Challenges of Electronics Technology Progress, ISSE 2004 - Conference Proceedings. IEEE Computer Society, 2004. p. 263-265 1490431 (Proceedings of the International Spring Seminar on Electronics Technology; Vol. 2).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Sheikholeslami, A, Heitzinger, C, Badrieh, F, Puchner, H & Selberherr, S 2004, Three-dimensional topography simulation based on a level set method [deposition and etching processes]. in 27th International Spring Seminar on Electronics Technology: Meeting the Challenges of Electronics Technology Progress, ISSE 2004 - Conference Proceedings., 1490431, Proceedings of the International Spring Seminar on Electronics Technology, vol. 2, IEEE Computer Society, pp. 263-265, 27th International Spring Seminar on Electronics Technology, ISSE 2004, Bankya, Bulgaria, 5/13/04. https://doi.org/10.1109/ISSE.2004.1490431

Sheikholeslami A, Heitzinger C, Badrieh F, Puchner H, Selberherr S. Three-dimensional topography simulation based on a level set method [deposition and etching processes]. In 27th International Spring Seminar on Electronics Technology: Meeting the Challenges of Electronics Technology Progress, ISSE 2004 - Conference Proceedings. IEEE Computer Society. 2004. p. 263-265. 1490431. (Proceedings of the International Spring Seminar on Electronics Technology). doi: 10.1109/ISSE.2004.1490431

Sheikholeslami, A. ; Heitzinger, C. ; Badrieh, F. et al. / Three-dimensional topography simulation based on a level set method [deposition and etching processes]. 27th International Spring Seminar on Electronics Technology: Meeting the Challenges of Electronics Technology Progress, ISSE 2004 - Conference Proceedings. IEEE Computer Society, 2004. pp. 263-265 (Proceedings of the International Spring Seminar on Electronics Technology).

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Three-dimensional topography simulation based on a level set method [deposition and etching processes]

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