Thickness dependence on the thermal stability of silver thin films

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Abstract

The dependence of silver resistivity on film thickness during temperature ramping was discussed. The in situ van der Pauw four point probe analysis was used to determine the onset temperature. The thermal stability of Ag thin films on silica in a vacuum was greatest when thicknesses were greater than 85 nm.

Original languageEnglish (US)
Pages (from-to)4287-4289
Number of pages3
JournalApplied Physics Letters
Volume81
Issue number22
DOIs
StatePublished - Nov 25 2002

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ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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