Thermodynamics of thin film epitaxy

R. C. Cammarata, Karl Sieradzki

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

The mechanics of thin film epitaxy is developed using an equilibrium thermodynamics formalism and linear elasticity. A virtual variation approach is employed that leads to a direct identification of the important volume and surface thermodynamic parameters characterizing mechanical equilibrium. In particular, the equilibrium volume stress state of an epitaxial film as a function of the film thickness, surface free energies, and surface stresses is obtained. It is shown how this formalism can be used to determine the critical thickness for epitaxy.

Original languageEnglish (US)
Pages (from-to)415-418
Number of pages4
JournalJournal of Applied Mechanics, Transactions ASME
Volume69
Issue number4
DOIs
StatePublished - Jul 2002
Externally publishedYes

Fingerprint

Epitaxial growth
epitaxy
Thermodynamics
Thin films
thermodynamics
thin films
formalism
Epitaxial films
thermodynamic equilibrium
Free energy
Film thickness
Elasticity
Mechanics
film thickness
elastic properties
free energy

ASJC Scopus subject areas

  • Computational Mechanics
  • Mechanics of Materials

Cite this

Thermodynamics of thin film epitaxy. / Cammarata, R. C.; Sieradzki, Karl.

In: Journal of Applied Mechanics, Transactions ASME, Vol. 69, No. 4, 07.2002, p. 415-418.

Research output: Contribution to journalArticle

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