Thermodynamics of amorphous SiN(O)H dielectric films synthesized by plasma-enhanced chemical vapor deposition

Engineering & Materials Science

• Dielectric films 100%
• Plasma enhanced chemical vapor deposition 96%
• Amorphous films 73%
• Gibbs free energy 62%
• Thermodynamics 58%
• Crystalline materials 47%
• Thermodynamic stability 46%
• Enthalpy 46%
• Calorimetry 29%
• High temperature applications 28%
• Cryogenics 23%
• Specific heat 23%
• Sodium 23%
• Structural analysis 22%
• Molten materials 22%
• Thin films 21%
• Semiconductor materials 19%
• Entropy 18%
• Oxygen 18%
• Hydrogen 17%
• Decomposition 16%
• Industry 9%
• Temperature 9%

Chemical Compounds

• Dielectric Film 98%
• Plasma Enhanced Chemical Vapour Deposition 81%
• Amorphous Material 46%
• Thermodynamics 41%
• Gibbs Energy of Formation 40%
• Gibbs Free Energy 25%
• Amorphous Film 22%
• Cryogenics 18%
• Molybdate 18%
• Heat Capacity 17%
• Enthalpy of Formation 16%
• Calorimetry 15%
• Thermodynamic Property 15%
• Entropy 13%
• Enthalpy 13%
• Semiconductor 12%
• Industry 12%
• Decomposition 10%
• Sodium Atom 10%
• Hydrogen 8%
• Dioxygen 8%
• Solvent 7%
• Application 5%