Theoretical hole mobility in a narrow Si/SiGe quantum well

B. Laikhtman, Richard Kiehl

Research output: Contribution to journalArticle

93 Citations (Scopus)

Abstract

Calculations of the hole mobility in a strained SiGe quantum well on (001) Si are carried out for the case of a narrow well in which the subband splittings are large due to quantum-size effects. An envelope-function model for the valence-band structure and hole wave functions in an infinite square well and calculations of scattering rates in a single parabolic band with an isotropic effective mass are used to delineate limitations on mobility imposed by lattice scattering, background impurities, alloy scattering, and interface roughness. Additional scattering mechanisms associated with compositional fluctuations in the SiGe layer are also discussed. Narrow wells (60 ) with high Ge content (40%) have large subband splittings and exhibit a light mass for hole densities well beyond 1012 cm-2. Scattering rates in such structures are greatly reduced as a result of the light mass and large subband splittings. Numerical results indicate that hole mobilities in the mid 103 cm2/V s at room temperature and in the mid 104 cm2/V s at low temperature could be possible in narrow SiGe wells as a result of the favorable modifications in band structure and scattering.

Original languageEnglish (US)
Pages (from-to)10515-10527
Number of pages13
JournalPhysical Review B
Volume47
Issue number16
DOIs
StatePublished - 1993
Externally publishedYes

Fingerprint

Hole mobility
hole mobility
Semiconductor quantum wells
quantum wells
Scattering
scattering
Band structure
square wells
Wave functions
Valence bands
envelopes
roughness
Surface roughness
wave functions
Impurities
valence
impurities
Temperature
room temperature

ASJC Scopus subject areas

  • Condensed Matter Physics

Cite this

Theoretical hole mobility in a narrow Si/SiGe quantum well. / Laikhtman, B.; Kiehl, Richard.

In: Physical Review B, Vol. 47, No. 16, 1993, p. 10515-10527.

Research output: Contribution to journalArticle

Laikhtman, B. ; Kiehl, Richard. / Theoretical hole mobility in a narrow Si/SiGe quantum well. In: Physical Review B. 1993 ; Vol. 47, No. 16. pp. 10515-10527.
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