The use of oxynitrides for the fabrication of buried contact silicon solar cells

A. U. Ebong, M. Taouk, Christiana Honsberg, S. R. Wenham

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

The formation of an oxynitride layer for use with solar cells has been demonstrated using simple equipment designed and assembled by the authors. The oxynitride has been successfully incorporated into the double sided buried contact silicon solar cells sequence, solving the fabrication difficulties associated with the use of an oxide masking layer. The output parameters, particularly the open-circuit voltage, are lower than those demonstrated by the use of a thick silicon dioxide film when working with conventional cell structures. This has been attributed to the inferior surface passivation qualities of the oxynitride. However, the oxynitride films are suitable for other devices like the multi-layer thin crystalline silicon buried contact structure [40].

Original languageEnglish (US)
Pages (from-to)183-195
Number of pages13
JournalSolar Energy Materials and Solar Cells
Volume40
Issue number2
DOIs
StatePublished - Apr 1996
Externally publishedYes

Fingerprint

Silicon solar cells
Fabrication
Silicon
Open circuit voltage
Passivation
Silicon Dioxide
Oxides
Solar cells
Silica
Crystalline materials

ASJC Scopus subject areas

  • Renewable Energy, Sustainability and the Environment
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films

Cite this

The use of oxynitrides for the fabrication of buried contact silicon solar cells. / Ebong, A. U.; Taouk, M.; Honsberg, Christiana; Wenham, S. R.

In: Solar Energy Materials and Solar Cells, Vol. 40, No. 2, 04.1996, p. 183-195.

Research output: Contribution to journalArticle

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