With electron beam induced deposition structures as small as 1 nm can be deposited. The nucleation stage of the growth of such deposits is studied in dependence of the substrate material and substrate temperature. On amorphous carbon foils larger deposit sizes are obtained at higher substrate temperatures during growth. On SiN membranes unusually high growth rates are observed which seem to relate to charging effects.
ASJC Scopus subject areas
- Physics and Astronomy(all)