Abstract
The formation of nickel and chromium silicides using an XeCl excimer laser has been studied. Both metals are deposited to a thickness of 500 Å by electron beam evaporation on silicon substrates. These layers are then processed using laser fluences ranging from 0.45 to 1.4 J/cm2, and a variable number of pulses. Rutherford backscattering spectrometry (RBS) and cross-sectional transmission electron microscopy (XTEM) indicate the formation of crystalline NiSi2 and CrSi2 at the Ni/Si and Cr/Si interfaces, respectively.
Original language | English (US) |
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Pages (from-to) | 57-60 |
Number of pages | 4 |
Journal | Journal of Crystal Growth |
Volume | 165 |
Issue number | 1-2 |
DOIs | |
State | Published - Jul 1996 |
ASJC Scopus subject areas
- Condensed Matter Physics
- Inorganic Chemistry
- Materials Chemistry