The electron-phonon relaxation time in thin superconducting titanium nitride films

A. Kardakova; M. Finkel; D. Morozov; V. Kovalyuk; P. An; C. Dunscombe; M. Tarkhov; P. Mauskopf; T. M. Klapwijk; G. Goltsman

doi:10.1063/1.4851235

The electron-phonon relaxation time in thin superconducting titanium nitride films

A. Kardakova, M. Finkel, D. Morozov, V. Kovalyuk, P. An, C. Dunscombe, M. Tarkhov, P. Mauskopf, T. M. Klapwijk, G. Goltsman

Research output: Contribution to journal › Article › peer-review

30 Scopus citations

Abstract

We report on the direct measurement of the electron-phonon relaxation time, τ_eph, in disordered TiN films. Measured values of τ_eph are from 5.5 ns to 88 ns in the 4.2 to 1.7 K temperature range and consistent with a T^-3 temperature dependence. The electronic density of states at the Fermi level N₀ is estimated from measured material parameters. The presented results confirm that thin TiN films are promising candidate-materials for ultrasensitive superconducting detectors.

Original language	English (US)
Article number	252602
Journal	Applied Physics Letters
Volume	103
Issue number	25
DOIs	https://doi.org/10.1063/1.4851235
State	Published - Dec 16 2013
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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title = "The electron-phonon relaxation time in thin superconducting titanium nitride films",

abstract = "We report on the direct measurement of the electron-phonon relaxation time, τeph, in disordered TiN films. Measured values of τeph are from 5.5 ns to 88 ns in the 4.2 to 1.7 K temperature range and consistent with a T-3 temperature dependence. The electronic density of states at the Fermi level N0 is estimated from measured material parameters. The presented results confirm that thin TiN films are promising candidate-materials for ultrasensitive superconducting detectors.",

author = "A. Kardakova and M. Finkel and D. Morozov and V. Kovalyuk and P. An and C. Dunscombe and M. Tarkhov and P. Mauskopf and Klapwijk, {T. M.} and G. Goltsman",

note = "Funding Information: The work was supported by the Ministry of Education and Science of the Russian Federation, Contract No. 14.B25.31.0007 and by the RFBR Grant No. 13-02-91159.",

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doi = "10.1063/1.4851235",

language = "English (US)",

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T1 - The electron-phonon relaxation time in thin superconducting titanium nitride films

AU - Kardakova, A.

AU - Finkel, M.

AU - Morozov, D.

AU - Kovalyuk, V.

AU - An, P.

AU - Dunscombe, C.

AU - Tarkhov, M.

AU - Mauskopf, P.

AU - Klapwijk, T. M.

AU - Goltsman, G.

N1 - Funding Information: The work was supported by the Ministry of Education and Science of the Russian Federation, Contract No. 14.B25.31.0007 and by the RFBR Grant No. 13-02-91159.

PY - 2013/12/16

Y1 - 2013/12/16

N2 - We report on the direct measurement of the electron-phonon relaxation time, τeph, in disordered TiN films. Measured values of τeph are from 5.5 ns to 88 ns in the 4.2 to 1.7 K temperature range and consistent with a T-3 temperature dependence. The electronic density of states at the Fermi level N0 is estimated from measured material parameters. The presented results confirm that thin TiN films are promising candidate-materials for ultrasensitive superconducting detectors.

AB - We report on the direct measurement of the electron-phonon relaxation time, τeph, in disordered TiN films. Measured values of τeph are from 5.5 ns to 88 ns in the 4.2 to 1.7 K temperature range and consistent with a T-3 temperature dependence. The electronic density of states at the Fermi level N0 is estimated from measured material parameters. The presented results confirm that thin TiN films are promising candidate-materials for ultrasensitive superconducting detectors.

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The electron-phonon relaxation time in thin superconducting titanium nitride films

Abstract

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