The effect of thin film/substrate radii on the stoney formula for thin film/substrate subjected to nonuniform axisymmetric misfit strain and temperature

Xue Feng, Yonggang Huang, Hanqing Jiang, Duc Ngo, Ares J. Rosakis

Research output: Contribution to journalArticlepeer-review

40 Scopus citations

Abstract

Current methodologies used for the inference of thin film stress through curvature measurements are strictly restricted to stress and curvature states which are assumed to remain uniform over the entire film/substrate system. There are recent studies of film/substrate systems subjected to nonuniform but axisymmetric misfit strain and temperature changes. The film stresses were found to depend nonlocally on system curvatures (that is, depend on the full-field curvatures). A very simple stress-curvature relation was established, but it is limited to thin film and substrate of same radius. We extend the analysis to thin film and substrate of different radii. Remarkably the same simple stress-curvature relation still holds regardless of the film/substrate radii mismatch.

Original languageEnglish (US)
Pages (from-to)1041-1053
Number of pages13
JournalJournal of Mechanics of Materials and Structures
Volume1
Issue number6
DOIs
StatePublished - 2006

Keywords

  • Interfacial shears
  • Nonlocal effects
  • Nonuniform misfit strain
  • Nonuniform wafer curvatures
  • Stress-curvature relations
  • Thin film radius

ASJC Scopus subject areas

  • Mechanics of Materials
  • Applied Mathematics

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