TY - JOUR
T1 - Texture formation in Ag thin films
T2 - Effect of W-Ti diffusion barriers
AU - Bhagat, S. K.
AU - Alford, Terry
N1 - Funding Information:
This work was partially supported by the National Science Foundation (L. Hess) (Grant No. DMR-0602716) to whom authors are greatly indebted. The authors are thankful to Dr. H. Han and K. J. Yoon for performing AFM investigation and volume fraction analysis, respectively. The authors also thank Mr. A. Ngo for critical review.
PY - 2008
Y1 - 2008
N2 - Pure Ag films were deposited on SiO2 /Si with and without introduction of W0.7 Ti0.3 barrier layers. The films were annealed in vacuum for 1 h at temperatures up to 650 °C. X-ray diffraction pole figure analysis was used to investigate the texture information in as-deposited and annealed films. After annealing, the {111} texture in Ag films increased; however, the degree of increase was significantly higher in Ag/W-Ti/ SiO2. In Ag/ SiO2 structures, the {200} texture also increased. In Ag/W-Ti/ SiO2 structures, no significant increase in {200} texture was observed; however, {111} twin related {511} texture evolved. In as-deposited samples, {111} pole figure revealed that {111} absolute intensity was higher in Ag/ SiO2 than in Ag/W-Ti/ SiO2. After annealing, Ag {111} intensity was always higher in Ag/W-Ti/ SiO2. Sources for the texture evolution were discussed in detail. Field emission scanning electron microscope showed the presence of twins and abnormal grain growth. After annealing at 650 °C, both the roughness and resistivity of Ag increased significantly.
AB - Pure Ag films were deposited on SiO2 /Si with and without introduction of W0.7 Ti0.3 barrier layers. The films were annealed in vacuum for 1 h at temperatures up to 650 °C. X-ray diffraction pole figure analysis was used to investigate the texture information in as-deposited and annealed films. After annealing, the {111} texture in Ag films increased; however, the degree of increase was significantly higher in Ag/W-Ti/ SiO2. In Ag/ SiO2 structures, the {200} texture also increased. In Ag/W-Ti/ SiO2 structures, no significant increase in {200} texture was observed; however, {111} twin related {511} texture evolved. In as-deposited samples, {111} pole figure revealed that {111} absolute intensity was higher in Ag/ SiO2 than in Ag/W-Ti/ SiO2. After annealing, Ag {111} intensity was always higher in Ag/W-Ti/ SiO2. Sources for the texture evolution were discussed in detail. Field emission scanning electron microscope showed the presence of twins and abnormal grain growth. After annealing at 650 °C, both the roughness and resistivity of Ag increased significantly.
UR - http://www.scopus.com/inward/record.url?scp=57049093841&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=57049093841&partnerID=8YFLogxK
U2 - 10.1063/1.3028233
DO - 10.1063/1.3028233
M3 - Article
AN - SCOPUS:57049093841
SN - 0021-8979
VL - 104
JO - Journal of Applied Physics
JF - Journal of Applied Physics
IS - 10
M1 - 103534
ER -