Tetraalkoxysilanes as slow-release substrates to promote aerobic and anaerobic dehalogenation reactions in the subsurface

Lewis Semprini, Sanjay Vancheeswaran, Seungho Yu, Min Ying Chu, Rolf Halden

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish (US)
Title of host publicationACS Division of Environmental Chemistry, Preprints
Pages350-352
Number of pages3
Volume40
Edition2
StatePublished - Aug 20 2000
Externally publishedYes

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Dehalogenation
Substrates

ASJC Scopus subject areas

  • Chemical Engineering(all)

Cite this

Semprini, L., Vancheeswaran, S., Yu, S., Chu, M. Y., & Halden, R. (2000). Tetraalkoxysilanes as slow-release substrates to promote aerobic and anaerobic dehalogenation reactions in the subsurface. In ACS Division of Environmental Chemistry, Preprints (2 ed., Vol. 40, pp. 350-352)

Tetraalkoxysilanes as slow-release substrates to promote aerobic and anaerobic dehalogenation reactions in the subsurface. / Semprini, Lewis; Vancheeswaran, Sanjay; Yu, Seungho; Chu, Min Ying; Halden, Rolf.

ACS Division of Environmental Chemistry, Preprints. Vol. 40 2. ed. 2000. p. 350-352.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Semprini, L, Vancheeswaran, S, Yu, S, Chu, MY & Halden, R 2000, Tetraalkoxysilanes as slow-release substrates to promote aerobic and anaerobic dehalogenation reactions in the subsurface. in ACS Division of Environmental Chemistry, Preprints. 2 edn, vol. 40, pp. 350-352.
Semprini L, Vancheeswaran S, Yu S, Chu MY, Halden R. Tetraalkoxysilanes as slow-release substrates to promote aerobic and anaerobic dehalogenation reactions in the subsurface. In ACS Division of Environmental Chemistry, Preprints. 2 ed. Vol. 40. 2000. p. 350-352
Semprini, Lewis ; Vancheeswaran, Sanjay ; Yu, Seungho ; Chu, Min Ying ; Halden, Rolf. / Tetraalkoxysilanes as slow-release substrates to promote aerobic and anaerobic dehalogenation reactions in the subsurface. ACS Division of Environmental Chemistry, Preprints. Vol. 40 2. ed. 2000. pp. 350-352
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