Surface x-ray diffraction was used to monitor the reaction of Ni on Si(111) at room temperature. Intensity oscillations during deposition signify that a layerwise reaction occurs for the first 30 Å of metal deposited, forming a silicide overlayer with stoichiometry Ni2Si. Structural analysis of the interfacial layers detects an epitaxial and commensurate phase, Ni2Si- θ, with long range order imposed by the substrate but with very large local atomic displacements. This epitaxial structure remains at the interface as amorphous silicide forms above it.
ASJC Scopus subject areas
- Physics and Astronomy(all)