TY - JOUR
T1 - Temperature-dependent kinetics of photophysical hole burning in a tetracene-doped mthf glass
AU - Elschner, A.
AU - Richert, R.
AU - Bässler, H.
N1 - Funding Information:
We gratefully acknowledgef inancial support by the Stiftung Volkswagenwerka nd the Fonds der ChemischenI ndustrie.
PY - 1986/6/6
Y1 - 1986/6/6
N2 - Kinetics of photophysical hole burning in a MTHF(TC) glass follows the concept of decoupled first-order reactions with Gaussian distribution of the tunnelling parameter. The decrease of the hole-burning yield with increasing temperature signals thermally activated hole refilling in the excited state. The ratio of TLS states responsible for dephasing and hole burning, respectively, is estimated to be ≈ 107.
AB - Kinetics of photophysical hole burning in a MTHF(TC) glass follows the concept of decoupled first-order reactions with Gaussian distribution of the tunnelling parameter. The decrease of the hole-burning yield with increasing temperature signals thermally activated hole refilling in the excited state. The ratio of TLS states responsible for dephasing and hole burning, respectively, is estimated to be ≈ 107.
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U2 - 10.1016/S0009-2614(86)80236-6
DO - 10.1016/S0009-2614(86)80236-6
M3 - Article
AN - SCOPUS:32644465027
SN - 0009-2614
VL - 127
SP - 105
EP - 110
JO - Chemical Physics Letters
JF - Chemical Physics Letters
IS - 2
ER -