Temperature-dependent kinetics of photophysical hole burning in a tetracene-doped mthf glass

A. Elschner, R. Richert, H. Bässler

Research output: Contribution to journalArticle

21 Scopus citations

Abstract

Kinetics of photophysical hole burning in a MTHF(TC) glass follows the concept of decoupled first-order reactions with Gaussian distribution of the tunnelling parameter. The decrease of the hole-burning yield with increasing temperature signals thermally activated hole refilling in the excited state. The ratio of TLS states responsible for dephasing and hole burning, respectively, is estimated to be ≈ 107.

Original languageEnglish (US)
Pages (from-to)105-110
Number of pages6
JournalChemical Physics Letters
Volume127
Issue number2
DOIs
StatePublished - Jun 6 1986
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Physical and Theoretical Chemistry

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