TEM, MICRODIFFRACTION AND ELECTRICAL STUDIES OF BURIED SiO//2 LAYERS FORMED BY HIGH DOSE OXYGEN IMPLANTATION.

D. Fathy, O. L. Krivanek, R. W. Carpenter, S. R. Wilson

Research output: Chapter in Book/Report/Conference proceedingConference contribution

6 Scopus citations
Original languageEnglish (US)
Title of host publicationInstitute of Physics Conference Series
PublisherInst of Physics
Pages479-484
Number of pages6
Edition67
ISBN (Print)0854981586
StatePublished - Dec 1 1983

Publication series

NameInstitute of Physics Conference Series
Number67
ISSN (Print)0373-0751

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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