Abstract

We present a method for microfabricating apertures in a silicon substrate using well-known cleanroom technologies resulting in highly reproducible giga-seal resistance bilayer formations. Using a plasma etcher, 150 μm apertures have been etched through a silicon wafer. Teflon™ has been chemically vapor deposited so that the surface resembles bulk Teflon and is hydrophobic. After fabrication, reproducible high resistance bilayers were formed and characteristic measurements of a self-inserted single OmpF porin ion channel protein were made.

Original languageEnglish (US)
Pages (from-to)3307-3309
Number of pages3
JournalApplied Physics Letters
Volume85
Issue number15
DOIs
StatePublished - Oct 11 2004

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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