Surface Morphology of Al_xGa_1-xN Films Grown by MOCVD

Engineering & Materials Science

• Metallorganic chemical vapor deposition 100%
• Surface morphology 71%
• Aluminum 32%
• Crystal growth 29%
• Screw dislocations 17%
• Dislocations (crystals) 16%
• Electronic properties 16%
• Growth kinetics 15%
• Buffer layers 15%
• Monolayers 13%
• Chemical analysis 13%
• Atomic force microscopy 13%
• Crystalline materials 11%
• Crystals 10%

Physics & Astronomy

• metalorganic chemical vapor deposition 60%
• pinholes 35%
• aluminum 17%
• crystal growth 11%
• atomic force microscopy 9%
• screw dislocations 7%
• craters 7%
• buffers 5%
• kinetics 3%
• electronics 3%
• crystals 3%

Chemical Compounds

• Liquid Film 30%
• Surface 20%
• Alloy 13%
• Crystal Growth 12%
• Screw Dislocation 10%
• Electronic Property 5%
• Atomic Force Microscopy 5%
• Monolayer 4%
• Molecular Cluster 4%
• Buffer Solution 4%
• Crystal Structure 3%