Surface cleaning, electronic states and electron affinity of diamond (100), (111) and (110) surfaces

Engineering & Materials Science

• Electron affinity 100%
• Electronic states 81%
• Surface cleaning 79%
• Diamonds 51%
• Plasmas 47%
• Annealing 25%
• Deuterium 22%
• Ultraviolet spectroscopy 18%
• Photoelectron spectroscopy 17%
• Hydrogen 12%
• Semiconducting diamonds 12%
• Low energy electron diffraction 11%
• Acids 9%
• Oxygen 8%
• Auger electron spectroscopy 7%
• Chemical cleaning 7%
• Diffraction patterns 7%
• Field emission 6%
• Atomic force microscopy 6%
• Isotopes 6%
• Cleaning 4%
• Vacuum 4%
• Temperature 2%

Physics & Astronomy

• negative electron affinity 64%
• electron affinity 58%
• cleaning 50%
• diamonds 40%
• electronics 26%
• chromic acid 19%
• annealing 17%
• deuterium plasma 15%
• hydrogen plasma 12%
• photoelectric emission 9%
• chemical cleaning 8%
• oxygen 6%
• isotope effect 6%
• spectroscopy 5%
• Auger spectroscopy 5%
• electron spectroscopy 5%
• deuterium 5%
• high current 5%
• field emission 5%
• electron diffraction 4%
• diffraction patterns 4%
• atomic force microscopy 4%
• wafers 4%
• vacuum 3%
• hydrogen 3%
• thresholds 3%
• temperature 1%
• energy 1%

Chemical Compounds

• Diamond 48%
• Electronic State 37%
• Plasma 31%
• Annealing 20%
• Surface 16%
• Deuterium(.) 13%
• Chromic Acid 13%
• Ultra-Violet Photoelectron Spectroscopy 13%
• Hydrogen 7%
• Low Energy Electron Diffraction 6%
• Auger Electron Spectroscopy 5%
• Isotope Effect 5%
• Field Emission 5%
• Dioxygen 4%
• Vacuum 4%
• Atomic Force Microscopy 4%
• Time 1%