@inproceedings{3f4274c43c93416ba4441b7f4135f2cc,
title = "Surface and interface morphology of small islands of TiSi2 and ZrSi2 on (001) silicon",
abstract = "The morphology of small islands of TiSi2 and ZrSi2 on Si(100) is investigated and compared to larger islands in terms of a solid state capillarity model. The silicide islands are formed by deposition of very thin layers of titanium and zirconium (3-50 Angstrom) followed by an anneal at high temperatures (700-1200°C). SEM and cross-sectional HRTEM are used to study respectively the surface and interface morphology. It is found that the C49-phase for TiSi2 is stable for layers as thin as 8 Angstrom, and annealing temperatures as high as 1200°C. An explanation for the fact that the formed islands align parallel to the Si directions is given in terms of interplanar lattice spacings.",
author = "Kropman, {B. L.} and Sukow, {C. A.} and Nemanich, {R. J.}",
year = "1993",
month = dec,
day = "1",
language = "English (US)",
isbn = "1558991751",
series = "Materials Research Society Symposium Proceedings",
publisher = "Publ by Materials Research Society",
pages = "589--592",
editor = "Atwater, {Harry A.} and Eric Chason and Grabow, {Marcia H.} and Lagally, {Max G.}",
booktitle = "Evolution of Surface and Thin Film Microstructure",
note = "Proceedings of the 1992 Fall Meeting of the Materials Research Society ; Conference date: 30-11-1992 Through 04-12-1992",
}