Sub-wavelength scale Si inverted pyramid fabrication with enhanced size control by using silica sphere lithography technique

Jea Young Choi, Christiana Honsberg

Research output: Contribution to journalArticle


In this paper, we present a novel silicon (Si) subwavelength-scale surface structure (SWSS) fabrication process using the silica sphere (SS) lithography technique, which allows controllable geometries. The process involves a new cost-effective solvent-controlled spin-coating method that deposits SS on large Si surface areas with enhanced SS monolayer coverage and uniformity compared to conventional methods. The larger areas and rapid, low cost processing allow colloidal sphere lithography to be realistically used for solar cells. We successfully demonstrate 1.57 μm diameter SS on a 2-inch round Si wafer with more than 95% SS monolayer coverage and great uniformity. Using these deposited SS, a SWSS fabrication process was designed and successfully demonstrated Si inverted pyramid structures with dimension on the order of 1.1 μm, thus potentially providing a new technique for effective light-management of thin crystalline Si solar cells.

Original languageEnglish (US)
Article number1720
JournalApplied Sciences (Switzerland)
Issue number10
Publication statusPublished - Sep 22 2018



  • Inverted pyramid
  • Silica sphere lithography
  • Solar cell
  • Spin-coating
  • Sub-wavelength

ASJC Scopus subject areas

  • Materials Science(all)
  • Instrumentation
  • Engineering(all)
  • Process Chemistry and Technology
  • Computer Science Applications
  • Fluid Flow and Transfer Processes

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