Sub-300 Å (Bax,Sr1-x)TiO3 films by metal organic chemical vapor deposition: Nanostructure, step coverage, and dielectric properties

Sandwip Dey, Prashant Majhi, Yong W. Shin, Derek Tang, Aaron Kirby, Jun Zhao, Charles Dornfest, Lee Lou, Shreyas Kher

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

Abstract

This is a preliminary report on the nanostructure and its evolution, step-coverage, and dielectric properties of sub-300 Å (Bax, Sr1-x)TiO3 films. The (001)-oriented polycrystalline films were deposited at 50-70 Åmin by metal-organic chemical vapor deposition (MOCVD) on (111) Pt-passivated Si substrates of 8-inch diameter. From the detailed nonstructural characterization of (Ba0.64, Sr0.36)TiO3 films, the orientation, cation stoichiometry, and an alternative but plausible mechanism of growth and the origin of roughness are forwarded. Additionally, the step-coverage in 2 : 1 to 5 : 1 aspect-ratio trenches, coupled with the frequency/voltage dependence of the dielectric properties of (Bax, Sr1-x)TiO3 films are reported. A 275 Å (Ba0.64, Sr0.36)TiO3 film exhibited a dispersionless dielectric permittivity and loss tangent of 260 and 0.003, respectively, and the permittivity (εr = 340) of a 300 Å (Ba0.5, Sr0.5)TiO3 film reduced by 53% at a dc-bias of 3 V.

Original languageEnglish (US)
Pages (from-to)3354-3358
Number of pages5
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume40
Issue number5 A
DOIs
StatePublished - May 2001

Keywords

  • BST
  • HRTEM
  • MOCVD
  • Nanostructure evolution
  • Roughness

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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