Abstract
We have developed a transport model, based on the solution of the Boltzmann Transport Equation, for modeling n-channel silicon-on-insulator MESFETs. All relevant scattering mechanisms for the silicon material system are included in the transport portion of the device simulator. From our simulations we have found that the mobility of the equivalent SOI MESFET device is three to five times higher than that of the SOI MOSFET in the sub-threshold regime. So, the cutoff frequency of the SOI MESFET will be higher than its conventional counter part.
Original language | English (US) |
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Title of host publication | 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings |
Editors | M. Laudon, B. Romanowicz |
Pages | 150-152 |
Number of pages | 3 |
State | Published - 2005 |
Event | 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 - Anaheim, CA, United States Duration: May 8 2005 → May 12 2005 |
Publication series
Name | 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings |
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Other
Other | 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 |
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Country/Territory | United States |
City | Anaheim, CA |
Period | 5/8/05 → 5/12/05 |
Keywords
- Low-field mobility
- Low-power r.f. applications
- Surface-roughness scattering
ASJC Scopus subject areas
- General Engineering