Structural, microstructural, and electrical properties of gold films and Schottky contacts on remote plasma-cleaned, n -type ZnO{0001} surfaces

B. J. Coppa, C. C. Fulton, S. M. Kiesel, R. F. Davis, C. Pandarinath, J. E. Burnette, Robert Nemanich, David Smith

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The structural and electrical properties of Schottky contacts and gold films on remote plasma-cleaned, n-type ZnO{0001} surfaces are discussed. Current-voltage measurements of Au contacts deposited on cleaned, n-type ZnO(0001) surfaces showed reverse bias leakage current densities of ∼0.01 A/cm 2 at 4.6 V reverse bias and ideality factors > 2. The similarly deposited Au Schottky contacts initially grew through the same mechanisms. The Plasma cleaning and cooling both surface in vacuum eliminated all detectable hydrocarbon contaminant, reduced the amount of the hydroxide layer to ∼0.4 ML, and resulted in a 0.7-eV reduction in downward band bending and 0.7 eV lowering of the surface Fermi level.

Original languageEnglish (US)
Article number103517
JournalJournal of Applied Physics
Issue number10
StatePublished - May 15 2005


ASJC Scopus subject areas

  • Physics and Astronomy(all)

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