TY - JOUR
T1 - Structural investigations of SiGe epitaxial layers grown by molecular beam epitaxy on Si(0 0 1) and Ge(0 0 1) substrates
T2 - I - High-resolution x-ray diffraction and x-ray topography
AU - Faleev, N.
AU - Sustersic, N.
AU - Bhargava, N.
AU - Kolodzey, J.
AU - Kazimirov, A. Yu
AU - Honsberg, Christiana
N1 - Funding Information:
This work is based upon research conducted at the Cornell High Energy Synchrotron Source (CHESS) which is supported by the National Science Foundation and the National Institutes of Health/National Institute of General Medical Sciences under NSF award DMR- 0936384 .” Special thanks to Thomas Adam for useful discussions about epitaxial growth. We gratefully acknowledge the use of facilities within the LeRoy Eyring Center for Solid State Science at Arizona State University.
PY - 2013
Y1 - 2013
N2 - Epitaxial structures of different SiGe composition grown by molecular beam epitaxy on Si(0 0 1) and Ge(0 0 1) substrates have been studied by high-resolution x-ray diffraction and x-ray topography to establish correlations between epitaxial growth conditions and crystal perfection. It was confirmed that epitaxy under initial elastic stress inevitably led to the creation of extended crystal defects. The type of defects created and their density and spatial distribution, strongly depended on the value and sign of the initial elastic strain, the elastic constants of solid solutions, the temperature of deposition and growth rate, and the thickness of the epitaxial layers. All of the investigated structures were classified by their crystal perfection, using x-ray diffraction with the volume density of dislocation loops as a parameter. It was found that the accommodation and relaxation of initial elastic stress and creation of crystal defects were multistage "chain" processes, necessary to stabilize the crystal structure at a level corresponding to the particular growth conditions. Types, density and spatial distribution of crystal defects, related to each stage of defect creation and matched to structural features, as revealed by high resolution x-ray diffraction, were considered for explanation.
AB - Epitaxial structures of different SiGe composition grown by molecular beam epitaxy on Si(0 0 1) and Ge(0 0 1) substrates have been studied by high-resolution x-ray diffraction and x-ray topography to establish correlations between epitaxial growth conditions and crystal perfection. It was confirmed that epitaxy under initial elastic stress inevitably led to the creation of extended crystal defects. The type of defects created and their density and spatial distribution, strongly depended on the value and sign of the initial elastic strain, the elastic constants of solid solutions, the temperature of deposition and growth rate, and the thickness of the epitaxial layers. All of the investigated structures were classified by their crystal perfection, using x-ray diffraction with the volume density of dislocation loops as a parameter. It was found that the accommodation and relaxation of initial elastic stress and creation of crystal defects were multistage "chain" processes, necessary to stabilize the crystal structure at a level corresponding to the particular growth conditions. Types, density and spatial distribution of crystal defects, related to each stage of defect creation and matched to structural features, as revealed by high resolution x-ray diffraction, were considered for explanation.
KW - A1. Characterization
KW - A1. Defects
KW - A3. Molecular beam epitaxy
KW - B1. Germanium silicon alloys
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U2 - 10.1016/j.jcrysgro.2012.12.002
DO - 10.1016/j.jcrysgro.2012.12.002
M3 - Article
AN - SCOPUS:84888373369
SN - 0022-0248
VL - 365
SP - 44
EP - 53
JO - Journal of Crystal Growth
JF - Journal of Crystal Growth
ER -