Abstract
Broad, low temperature photoluminescence (PL) peaks near 3.4-3.42 eV in GaN have previously been associated with basal-plane stacking faults. Recently, we observed unusually sharp and highly structured PL peaks in this region in high quality bulk GaN grown from a Na/Ga flux, some of which display characteristic shifts and narrowing as a function of excitation power. Here, we study these peaks as a function of excitation intensity and crystal polarity, and compare them to those observed in GaN grown on off-axis SiC or sapphire (0001) substrates by metalorganic chemical vapor deposition (MOCVD). In the off-axis material on either substrate, similar peaks are observed to those in the bulk samples. In addition, a low energy peak near 3.21 eV is observed, which does not occur in the bulk material.
Original language | English (US) |
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Title of host publication | Materials Research Society Symposium - Proceedings |
Editors | H.M. Ng, M. Wraback, K. Hiramatsu, N. Grandjean |
Pages | 637-642 |
Number of pages | 6 |
Volume | 798 |
State | Published - 2003 |
Event | GaN and Related Alloys - 2003 - Boston, MA, United States Duration: Dec 1 2003 → Dec 5 2003 |
Other
Other | GaN and Related Alloys - 2003 |
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Country/Territory | United States |
City | Boston, MA |
Period | 12/1/03 → 12/5/03 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials