Structural characterization of ultrathin nanocrystalline silicon films formed by annealing amorphous silicon

J. Lützen, A. H M Kamal, Michael Kozicki, D. K. Ferry, M. V. Sidorov, David Smith

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

The fabrication and structural characteristics of ultrathin nanocrystallization silicon films is reported. Amorphous Si layers, with nominal thicknesses in the range of 3.5-11 nm, were deposited by low-pressure chemical vapor deposition onto amorphous SiO 2 and then crystallized using rapid thermal annealing at temperatures from 650 to 750 °C. High-resolution electron microscopy revealed that the resulting films were comprised almost entirely of Si nanocrystallites with a small fraction of remaining amorphous material. The grain size in the vertical growth direction was controlled by the thickness of the as-deposited amorphous Si film, whereas the lateral grain size was determined by appropriate choice of the annealing conditions.

Original languageEnglish (US)
Pages (from-to)2802-2805
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume16
Issue number5
StatePublished - Sep 1998

Fingerprint

Nanocrystalline silicon
silicon films
Amorphous silicon
amorphous silicon
grain size
Annealing
annealing
amorphous materials
electron microscopy
low pressure
vapor deposition
Nanocrystallization
Low pressure chemical vapor deposition
Nanocrystallites
fabrication
Rapid thermal annealing
High resolution electron microscopy
high resolution
Fabrication
Silicon

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Surfaces and Interfaces
  • Physics and Astronomy (miscellaneous)

Cite this

Structural characterization of ultrathin nanocrystalline silicon films formed by annealing amorphous silicon. / Lützen, J.; Kamal, A. H M; Kozicki, Michael; Ferry, D. K.; Sidorov, M. V.; Smith, David.

In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 16, No. 5, 09.1998, p. 2802-2805.

Research output: Contribution to journalArticle

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