Abstract
We report the demonstration of molecular beam epitaxy (MBE) grown InAs/AlSb superlattices with properties suitable for cladding layer materials in semiconductor diode lasers operating in the 2–5 μm spectral range. X-ray rocking curves of these superlattices reveal excellent structural quality and small lattice mismatch (Δa/a = 1.2 × 10−3) with respect to a GaSb substrate. Hall measurements reveal that controllable n-type doping of InAs/AlSb superlattices can be achieved by selectively codepositing silicon during growth of InAs layers. p-Type doping is performed by codepositing beryllium during growth of AlSb layers. InAs/AlSb superlattice p-n junctions have been fabricated and tested, yielding classical p-n diode current-voltage behavior. A simple double heterojunction diode laser, incorporating InAs/AlSb superlattice cladding layers and a GaxIn1−xAsySb1−y active layer, is demonstrated. The emission wavelength of the laser is 2.42 μm (2.50 μm) at 95 K (180 K).
Original language | English (US) |
---|---|
Pages (from-to) | 879-882 |
Number of pages | 4 |
Journal | Journal of Crystal Growth |
Volume | 150 |
DOIs | |
State | Published - 1995 |
Externally published | Yes |
ASJC Scopus subject areas
- Condensed Matter Physics
- Inorganic Chemistry
- Materials Chemistry