Structural and optical properties of ZrB₂ and Hf_xZr_1-xB₂ films grown by vicinal surface epitaxy on Si(1 1 1) substrates

Engineering & Materials Science

• Epitaxial growth 100%
• Optical properties 88%
• Structural properties 77%
• Substrates 50%
• Buffer layers 25%
• Nitrides 21%
• Chemical vapor deposition 20%
• Semiconductor materials 15%
• Surface roughness 14%

Chemical Compounds

• Epitaxial Growth 86%
• Optical Property 51%
• Liquid Film 34%
• Surface 22%
• Percent Reduction 20%
• Nitride 17%
• Chemical Vapour Deposition 16%
• Semiconductor 13%
• Strain 12%
• Buffer Solution 11%
• Amount 7%

Physics & Astronomy

• epitaxy 70%
• optical properties 46%
• nitrides 16%
• buffers 15%
• roughness 14%
• vapor deposition 13%
• electrical resistivity 11%