Abstract

We report the demonstration of a steep-slope field-effect transistor with AlGaN/GaN MIS-HEMTs employing SiO 2 -based threshold switching devices in series with the source. The SiO 2 -based threshold switching devices exhibited steep slope when changing resistance states. The integrated steep-slope transistor showed a low subthreshold swing of sub-5 mV/dec with a transition range of over 10 5 in the transfer characteristics in both sweep directions at room temperature, as well as the low leakage current (10 -5 μA μm -1 ) and a high I ON /I OFF ratio (>10 7 ). Moreover, with the SiO 2 -based threshold switching devices we also observed a positive shift of threshold voltages of the integrated device. Results from more than 50 transfer characteristics measurements also indicate the good repeatability and practicability of such a steep-switching device, where the average steep slopes are below 10 mV/decade. This steep-slope transistor with oxide-based threshold switching devices can be further extended to various transistor platforms like Si and III-V and are of potential interest for the development of power switching and high frequency devices.

Original languageEnglish (US)
Article number215201
JournalNanotechnology
Volume30
Issue number21
DOIs
StatePublished - Mar 13 2019

Keywords

  • Boltzmann limit
  • gallium nitride
  • steep slope
  • threshold switching
  • transistor

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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  • Cite this

    Huang, X., Fang, R., Yang, C., Fu, K., Fu, H., Chen, H., Yang, T. H., Zhou, J., Montes, J., Kozicki, M., Barnaby, H., Zhang, B., & Zhao, Y. (2019). Steep-slope field-effect transistors with AlGaN/GaN HEMT and oxide-based threshold switching device. Nanotechnology, 30(21), [215201]. https://doi.org/10.1088/1361-6528/ab0484