Statistical monitoring techniques for contamination data

Douglas Montgomery, J. Bert Keats, Geetha Rajavelu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

Monitoring of particle contamination by statistically-based methods is used extensively in semiconductor manufacturing. Often, Shewhart-type control charts are used for this purpose. These charts suffer from some potential disadvantages in this application environment. We suggest the use of cumulative sum and exponentially weighted moving average control charts for monitoring particle contamination. The advantages of these charts are discussed and illustrated with examples.

Original languageEnglish (US)
Title of host publicationInstitute of Environmental Sciences - Proceedings, Annual Technical Meeting
PublisherInst of Environmental Sciences
Pages304-310
Number of pages7
StatePublished - 1996
EventProceedings of the 1996 42nd Annual Technical Meeting of the Institute of Environmental Sciences - Orlando, FL, USA
Duration: May 12 1996May 16 1996

Other

OtherProceedings of the 1996 42nd Annual Technical Meeting of the Institute of Environmental Sciences
CityOrlando, FL, USA
Period5/12/965/16/96

ASJC Scopus subject areas

  • Environmental Engineering

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  • Cite this

    Montgomery, D., Keats, J. B., & Rajavelu, G. (1996). Statistical monitoring techniques for contamination data. In Institute of Environmental Sciences - Proceedings, Annual Technical Meeting (pp. 304-310). Inst of Environmental Sciences.