Abstract
Monitoring of particle contamination by statistically-based methods is used extensively in semiconductor manufacturing. Often, Shewhart-type control charts are used for this purpose. These charts suffer from some potential disadvantages in this application environment. We suggest the use of cumulative sum and exponentially weighted moving average control charts for monitoring particle contamination. The advantages of these charts are discussed and illustrated with examples.
| Original language | English (US) |
|---|---|
| Title of host publication | Institute of Environmental Sciences - Proceedings, Annual Technical Meeting |
| Publisher | Inst of Environmental Sciences |
| Pages | 304-310 |
| Number of pages | 7 |
| State | Published - 1996 |
| Event | Proceedings of the 1996 42nd Annual Technical Meeting of the Institute of Environmental Sciences - Orlando, FL, USA Duration: May 12 1996 → May 16 1996 |
Other
| Other | Proceedings of the 1996 42nd Annual Technical Meeting of the Institute of Environmental Sciences |
|---|---|
| City | Orlando, FL, USA |
| Period | 5/12/96 → 5/16/96 |
ASJC Scopus subject areas
- Environmental Engineering