Spectroscopic study of microwave-enhanced silicon exfoliation

D. C. Thompson; Terry Alford; J. W. Mayer

doi:10.1063/1.2842420

Spectroscopic study of microwave-enhanced silicon exfoliation

D. C. Thompson, Terry Alford, J. W. Mayer

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

Infrared spectroscopy and Rutherford backscattering spectrometry are used to study the effect of microwaves on hydrogen implanted silicon. Infrared spectra demonstrate that the hydride species formed in hydrogen implant and microwave annealed silicon result in exfoliation in a manner similar to that in conductively annealed samples. The infrared spectra of microwave annealed samples reveal an increase in internal surface formation prior to exfoliation. This increase in internal surface formation demonstrates how microwave anneals can decrease the incubation time required prior to exfoliation. Rutherford backscattering and infrared spectra are presented to elucidate the minimized impact of the microwave effect in boron-hydrogen coimplanted silicon.

Original language	English (US)
Article number	082102
Journal	Applied Physics Letters
Volume	92
Issue number	8
DOIs	https://doi.org/10.1063/1.2842420
State	Published - 2008

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.2842420

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title = "Spectroscopic study of microwave-enhanced silicon exfoliation",

abstract = "Infrared spectroscopy and Rutherford backscattering spectrometry are used to study the effect of microwaves on hydrogen implanted silicon. Infrared spectra demonstrate that the hydride species formed in hydrogen implant and microwave annealed silicon result in exfoliation in a manner similar to that in conductively annealed samples. The infrared spectra of microwave annealed samples reveal an increase in internal surface formation prior to exfoliation. This increase in internal surface formation demonstrates how microwave anneals can decrease the incubation time required prior to exfoliation. Rutherford backscattering and infrared spectra are presented to elucidate the minimized impact of the microwave effect in boron-hydrogen coimplanted silicon.",

author = "Thompson, {D. C.} and Terry Alford and Mayer, {J. W.}",

note = "Funding Information: This work was partially supported by a grant from the NSF (DMR-0602716, L. Hess). ",

year = "2008",

doi = "10.1063/1.2842420",

language = "English (US)",

volume = "92",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

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T1 - Spectroscopic study of microwave-enhanced silicon exfoliation

AU - Thompson, D. C.

AU - Alford, Terry

AU - Mayer, J. W.

N1 - Funding Information: This work was partially supported by a grant from the NSF (DMR-0602716, L. Hess).

PY - 2008

Y1 - 2008

N2 - Infrared spectroscopy and Rutherford backscattering spectrometry are used to study the effect of microwaves on hydrogen implanted silicon. Infrared spectra demonstrate that the hydride species formed in hydrogen implant and microwave annealed silicon result in exfoliation in a manner similar to that in conductively annealed samples. The infrared spectra of microwave annealed samples reveal an increase in internal surface formation prior to exfoliation. This increase in internal surface formation demonstrates how microwave anneals can decrease the incubation time required prior to exfoliation. Rutherford backscattering and infrared spectra are presented to elucidate the minimized impact of the microwave effect in boron-hydrogen coimplanted silicon.

AB - Infrared spectroscopy and Rutherford backscattering spectrometry are used to study the effect of microwaves on hydrogen implanted silicon. Infrared spectra demonstrate that the hydride species formed in hydrogen implant and microwave annealed silicon result in exfoliation in a manner similar to that in conductively annealed samples. The infrared spectra of microwave annealed samples reveal an increase in internal surface formation prior to exfoliation. This increase in internal surface formation demonstrates how microwave anneals can decrease the incubation time required prior to exfoliation. Rutherford backscattering and infrared spectra are presented to elucidate the minimized impact of the microwave effect in boron-hydrogen coimplanted silicon.

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ER -

Spectroscopic study of microwave-enhanced silicon exfoliation

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