Solution processed large area surface textures based on dip coating

Wang Yuehui, Hongjun Yang, Li Chen, Weidong Zhou, Meng Tao, Guo Qing

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We report here the dip coating processes for the formation of large area self-assembled monolayer of micro-sized silica spheres, on glass and on silicon substrates. The self-assembled structure and its spatial extent of monolayer were significantly influenced by the concentration of the suspension and the type of solvent, dip coating withdrawal speed, sample immersion time, relative humidity and substrate types. Record large areas of uniformly coated structures were formed with dimensions of 3×10 mm2 and 1.5×11 mm2 on the silicon and glass substrates, respectively. The rapid self-assembled monolayer with silica microspheres provided a glimpse at the wide range of coating and photonic device applications where dip coating can be used.

Original languageEnglish (US)
Title of host publication2008 8th IEEE Conference on Nanotechnology, IEEE-NANO
Pages771-774
Number of pages4
DOIs
Publication statusPublished - 2008
Externally publishedYes
Event2008 8th IEEE Conference on Nanotechnology, IEEE-NANO - Arlington, TX, United States
Duration: Aug 18 2008Aug 21 2008

Other

Other2008 8th IEEE Conference on Nanotechnology, IEEE-NANO
CountryUnited States
CityArlington, TX
Period8/18/088/21/08

    Fingerprint

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

Cite this

Yuehui, W., Yang, H., Chen, L., Zhou, W., Tao, M., & Qing, G. (2008). Solution processed large area surface textures based on dip coating. In 2008 8th IEEE Conference on Nanotechnology, IEEE-NANO (pp. 771-774). [4617212] https://doi.org/10.1109/NANO.2008.230