Abstract
Conventional poly(dimethylsiloxane) (PDMS) soft lithography relies on photolithography for fabrication of micropatterned molds.. Here, we present an alternative method to fabricate microfluidic devices using microscale PLasma Activated Templating (μPLAT). The use of photoresist in soft lithography is replaced by patterned water droplets created using μPLAT. As a result, device fabrication is less time consuming, more cost efficient and flexible, and ideal for rapid prototyping. Furthermore, this method has unique features that are difficult to achieve using photolithography.
Original language | English (US) |
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Title of host publication | Micro Total Analysis Systems - Proceedings of MicroTAS 2006 Conference: 10th International Conference on Miniaturized Systems for Chemistry and Life Sciences |
Publisher | Japan Academic Association Inc |
Pages | 672-674 |
Number of pages | 3 |
State | Published - 2006 |
Externally published | Yes |
Event | 10th International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2006 - Tokyo, Japan Duration: Nov 5 2006 → Nov 9 2006 |
Other
Other | 10th International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2006 |
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Country/Territory | Japan |
City | Tokyo |
Period | 11/5/06 → 11/9/06 |
Keywords
- Hydrophobicity
- Microscale plasma activated templating
- PDMS
- Soft lithography
- μPLAT
ASJC Scopus subject areas
- Chemical Engineering (miscellaneous)
- Bioengineering