Soft lithography without using photolithography

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

Conventional poly(dimethylsiloxane) (PDMS) soft lithography relies on photolithography for fabrication of micropatterned molds.. Here, we present an alternative method to fabricate microfluidic devices using microscale PLasma Activated Templating (μPLAT). The use of photoresist in soft lithography is replaced by patterned water droplets created using μPLAT. As a result, device fabrication is less time consuming, more cost efficient and flexible, and ideal for rapid prototyping. Furthermore, this method has unique features that are difficult to achieve using photolithography.

Original languageEnglish (US)
Title of host publicationMicro Total Analysis Systems - Proceedings of MicroTAS 2006 Conference: 10th International Conference on Miniaturized Systems for Chemistry and Life Sciences
PublisherJapan Academic Association Inc
Pages672-674
Number of pages3
StatePublished - 2006
Externally publishedYes
Event10th International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2006 - Tokyo, Japan
Duration: Nov 5 2006Nov 9 2006

Other

Other10th International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS 2006
CountryJapan
CityTokyo
Period11/5/0611/9/06

Keywords

  • Hydrophobicity
  • Microscale plasma activated templating
  • PDMS
  • Soft lithography
  • μPLAT

ASJC Scopus subject areas

  • Chemical Engineering (miscellaneous)
  • Bioengineering

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  • Cite this

    Chao, S-H., Carlson, R., & Meldrum, D. (2006). Soft lithography without using photolithography. In Micro Total Analysis Systems - Proceedings of MicroTAS 2006 Conference: 10th International Conference on Miniaturized Systems for Chemistry and Life Sciences (pp. 672-674). Japan Academic Association Inc.