TY - GEN
T1 - Soft lithographic printing of titanium dioxide and the resulting silica contamination layer
AU - Curtis, Travis
AU - Munukutla, Lakshmi V.
AU - Mada Kannan, Arunachala
N1 - Publisher Copyright:
© 2014 Materials Research Society.
PY - 2014
Y1 - 2014
N2 - Soft lithographic printing techniques can be used to print nanoparticle dispersions with relative ease while allowing for a measureable degree of controllability of printed feature size. In this study, a Polydimethylsiloxane (PDMS) stamp was used to print multi-layered, porous, nanoparticle dispersions of titanium dioxide (Ti02), for use in a dye-sensitized solar cell application. The gelled patterns were then sintered and the surface of the printed sample was chemically analyzed. X-ray photoelectron spectroscopy (XPS) was used to determine the surface constituents of the printed sample. The presence of a secondary peak feature located approximately 2.8 eV above the high resolution Ols core level binding energy peak was attributed to a contamination layer. Fourier transform infrared spectra (FTIR) of the printed sample revealed the presence of vibrational modes characteristic of the asymmetric bond stretching of silica, located at approximate wavenumbers of 1260 and 1030 cm-1. Soft lithographic techniques are a viable manufacturing technique in a number of disciplines and sintered nano-oxide dispersions are readily used as reaction centers in a number of technologies. The presence of a residual, bonded silicate contamination layer may preclude the soft lithographic printing of chemically active oxide surfaces.
AB - Soft lithographic printing techniques can be used to print nanoparticle dispersions with relative ease while allowing for a measureable degree of controllability of printed feature size. In this study, a Polydimethylsiloxane (PDMS) stamp was used to print multi-layered, porous, nanoparticle dispersions of titanium dioxide (Ti02), for use in a dye-sensitized solar cell application. The gelled patterns were then sintered and the surface of the printed sample was chemically analyzed. X-ray photoelectron spectroscopy (XPS) was used to determine the surface constituents of the printed sample. The presence of a secondary peak feature located approximately 2.8 eV above the high resolution Ols core level binding energy peak was attributed to a contamination layer. Fourier transform infrared spectra (FTIR) of the printed sample revealed the presence of vibrational modes characteristic of the asymmetric bond stretching of silica, located at approximate wavenumbers of 1260 and 1030 cm-1. Soft lithographic techniques are a viable manufacturing technique in a number of disciplines and sintered nano-oxide dispersions are readily used as reaction centers in a number of technologies. The presence of a residual, bonded silicate contamination layer may preclude the soft lithographic printing of chemically active oxide surfaces.
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U2 - 10.1557/opl.2014.801
DO - 10.1557/opl.2014.801
M3 - Conference contribution
AN - SCOPUS:84922453999
T3 - Materials Research Society Symposium Proceedings
SP - 177
EP - 183
BT - Synthesis, Characterization, and Applications of Functional Materials - Thin Films and Nanostructures
A2 - Jia, Quanxi
A2 - Kumar, Dhananjay
A2 - Obradors, Xavier
A2 - Singh, Kaushal K.
A2 - Craciun, Valentin
A2 - Guilloux-Viry, Maryline
A2 - Jain, Menka
A2 - Kozuka, Hiromitsu
A2 - Mathur, Sanjay
PB - Materials Research Society
T2 - 2014 MRS Spring Meeting
Y2 - 21 April 2014 through 25 April 2014
ER -