Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics

Natasa Vulic; Jea Young Choi; Christiana Honsberg; Stephen Goodnick

doi:10.1557/opl.2015.548

Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics

Natasa Vulic, Jea Young Choi, Christiana Honsberg, Stephen Goodnick

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Scopus citations

Abstract

Periodic arrays of low-aspect ratio silicon nanopillars strongly reduce front surface reflection over a broad wavelength range. In this study, we numerically simulate the reflection of light for thick crystalline silicon substrates nanostructured through a combination of silica nanosphere lithography (SNL) and metal-assisted chemical etching (MaCE), producing ordered arrays of nanopillars with hexagonal periodicity. Using statistical methods, we show that the simulated measurements are in good agreement with the spectrophotometry measurements of the fabricated nanopillars.

Original language	English (US)
Title of host publication	Emerging Silicon Science and Technology
Publisher	Materials Research Society
Pages	31-36
Number of pages	6
Volume	1770
ISBN (Electronic)	9781510826267
DOIs	https://doi.org/10.1557/opl.2015.548
State	Published - 2015
Event	2015 MRS Spring Meeting - San Francisco, United States Duration: Apr 6 2015 → Apr 10 2015

Other

Other	2015 MRS Spring Meeting
Country	United States
City	San Francisco
Period	4/6/15 → 4/10/15

Fingerprint

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

Cite this

Vulic, N., Choi, J. Y., Honsberg, C., & Goodnick, S. (2015). Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics. In Emerging Silicon Science and Technology (Vol. 1770, pp. 31-36). Materials Research Society. https://doi.org/10.1557/opl.2015.548

@inproceedings{98a538a0f9bc4320995f297175aa3013,

title = "Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics",

abstract = "Periodic arrays of low-aspect ratio silicon nanopillars strongly reduce front surface reflection over a broad wavelength range. In this study, we numerically simulate the reflection of light for thick crystalline silicon substrates nanostructured through a combination of silica nanosphere lithography (SNL) and metal-assisted chemical etching (MaCE), producing ordered arrays of nanopillars with hexagonal periodicity. Using statistical methods, we show that the simulated measurements are in good agreement with the spectrophotometry measurements of the fabricated nanopillars.",

author = "Natasa Vulic and Choi, {Jea Young} and Christiana Honsberg and Stephen Goodnick",

year = "2015",

doi = "10.1557/opl.2015.548",

language = "English (US)",

volume = "1770",

pages = "31--36",

booktitle = "Emerging Silicon Science and Technology",

publisher = "Materials Research Society",

note = "2015 MRS Spring Meeting ; Conference date: 06-04-2015 Through 10-04-2015",

}

TY - GEN

T1 - Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics

AU - Vulic, Natasa

AU - Choi, Jea Young

AU - Honsberg, Christiana

AU - Goodnick, Stephen

PY - 2015

Y1 - 2015

N2 - Periodic arrays of low-aspect ratio silicon nanopillars strongly reduce front surface reflection over a broad wavelength range. In this study, we numerically simulate the reflection of light for thick crystalline silicon substrates nanostructured through a combination of silica nanosphere lithography (SNL) and metal-assisted chemical etching (MaCE), producing ordered arrays of nanopillars with hexagonal periodicity. Using statistical methods, we show that the simulated measurements are in good agreement with the spectrophotometry measurements of the fabricated nanopillars.

AB - Periodic arrays of low-aspect ratio silicon nanopillars strongly reduce front surface reflection over a broad wavelength range. In this study, we numerically simulate the reflection of light for thick crystalline silicon substrates nanostructured through a combination of silica nanosphere lithography (SNL) and metal-assisted chemical etching (MaCE), producing ordered arrays of nanopillars with hexagonal periodicity. Using statistical methods, we show that the simulated measurements are in good agreement with the spectrophotometry measurements of the fabricated nanopillars.

UR - http://www.scopus.com/inward/record.url?scp=84961680435&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84961680435&partnerID=8YFLogxK

U2 - 10.1557/opl.2015.548

DO - 10.1557/opl.2015.548

M3 - Conference contribution

AN - SCOPUS:84961680435

VL - 1770

SP - 31

EP - 36

BT - Emerging Silicon Science and Technology

PB - Materials Research Society

T2 - 2015 MRS Spring Meeting

Y2 - 6 April 2015 through 10 April 2015

ER -

Access to Document

10.1557/opl.2015.548