Abstract
Periodic arrays of low-aspect ratio silicon nanopillars strongly reduce front surface reflection over a broad wavelength range. In this study, we numerically simulate the reflection of light for thick crystalline silicon substrates nanostructured through a combination of silica nanosphere lithography (SNL) and metal-assisted chemical etching (MaCE), producing ordered arrays of nanopillars with hexagonal periodicity. Using statistical methods, we show that the simulated measurements are in good agreement with the spectrophotometry measurements of the fabricated nanopillars.
| Original language | English (US) |
|---|---|
| Title of host publication | Emerging Silicon Science and Technology |
| Publisher | Materials Research Society |
| Pages | 31-36 |
| Number of pages | 6 |
| Volume | 1770 |
| ISBN (Electronic) | 9781510826267 |
| DOIs | |
| State | Published - 2015 |
| Event | 2015 MRS Spring Meeting - San Francisco, United States Duration: Apr 6 2015 → Apr 10 2015 |
Other
| Other | 2015 MRS Spring Meeting |
|---|---|
| Country | United States |
| City | San Francisco |
| Period | 4/6/15 → 4/10/15 |
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ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering
Cite this
Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics. / Vulic, Natasa; Choi, Jea Young; Honsberg, Christiana; Goodnick, Stephen.
Emerging Silicon Science and Technology. Vol. 1770 Materials Research Society, 2015. p. 31-36.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics
AU - Vulic, Natasa
AU - Choi, Jea Young
AU - Honsberg, Christiana
AU - Goodnick, Stephen
PY - 2015
Y1 - 2015
N2 - Periodic arrays of low-aspect ratio silicon nanopillars strongly reduce front surface reflection over a broad wavelength range. In this study, we numerically simulate the reflection of light for thick crystalline silicon substrates nanostructured through a combination of silica nanosphere lithography (SNL) and metal-assisted chemical etching (MaCE), producing ordered arrays of nanopillars with hexagonal periodicity. Using statistical methods, we show that the simulated measurements are in good agreement with the spectrophotometry measurements of the fabricated nanopillars.
AB - Periodic arrays of low-aspect ratio silicon nanopillars strongly reduce front surface reflection over a broad wavelength range. In this study, we numerically simulate the reflection of light for thick crystalline silicon substrates nanostructured through a combination of silica nanosphere lithography (SNL) and metal-assisted chemical etching (MaCE), producing ordered arrays of nanopillars with hexagonal periodicity. Using statistical methods, we show that the simulated measurements are in good agreement with the spectrophotometry measurements of the fabricated nanopillars.
UR - http://www.scopus.com/inward/record.url?scp=84961680435&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84961680435&partnerID=8YFLogxK
U2 - 10.1557/opl.2015.548
DO - 10.1557/opl.2015.548
M3 - Conference contribution
AN - SCOPUS:84961680435
VL - 1770
SP - 31
EP - 36
BT - Emerging Silicon Science and Technology
PB - Materials Research Society
ER -