Abstract

Periodic arrays of low-aspect ratio silicon nanopillars strongly reduce front surface reflection over a broad wavelength range. In this study, we numerically simulate the reflection of light for thick crystalline silicon substrates nanostructured through a combination of silica nanosphere lithography (SNL) and metal-assisted chemical etching (MaCE), producing ordered arrays of nanopillars with hexagonal periodicity. Using statistical methods, we show that the simulated measurements are in good agreement with the spectrophotometry measurements of the fabricated nanopillars.

Original languageEnglish (US)
Title of host publicationEmerging Silicon Science and Technology
PublisherMaterials Research Society
Pages31-36
Number of pages6
Volume1770
ISBN (Electronic)9781510826267
DOIs
StatePublished - 2015
Event2015 MRS Spring Meeting - San Francisco, United States
Duration: Apr 6 2015Apr 10 2015

Other

Other2015 MRS Spring Meeting
CountryUnited States
CitySan Francisco
Period4/6/154/10/15

Fingerprint

Nanospheres
Silicon
Silicon Dioxide
Lithography
lithography
trapping
Silica
silicon dioxide
low aspect ratio
Spectrophotometry
silicon
spectrophotometry
Aspect ratio
periodic variations
Etching
Statistical methods
Metals
etching
Crystalline materials
Wavelength

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Vulic, N., Choi, J. Y., Honsberg, C., & Goodnick, S. (2015). Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics. In Emerging Silicon Science and Technology (Vol. 1770, pp. 31-36). Materials Research Society. https://doi.org/10.1557/opl.2015.548

Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics. / Vulic, Natasa; Choi, Jea Young; Honsberg, Christiana; Goodnick, Stephen.

Emerging Silicon Science and Technology. Vol. 1770 Materials Research Society, 2015. p. 31-36.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Vulic, N, Choi, JY, Honsberg, C & Goodnick, S 2015, Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics. in Emerging Silicon Science and Technology. vol. 1770, Materials Research Society, pp. 31-36, 2015 MRS Spring Meeting, San Francisco, United States, 4/6/15. https://doi.org/10.1557/opl.2015.548
Vulic N, Choi JY, Honsberg C, Goodnick S. Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics. In Emerging Silicon Science and Technology. Vol. 1770. Materials Research Society. 2015. p. 31-36 https://doi.org/10.1557/opl.2015.548
Vulic, Natasa ; Choi, Jea Young ; Honsberg, Christiana ; Goodnick, Stephen. / Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics. Emerging Silicon Science and Technology. Vol. 1770 Materials Research Society, 2015. pp. 31-36
@inproceedings{98a538a0f9bc4320995f297175aa3013,
title = "Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics",
abstract = "Periodic arrays of low-aspect ratio silicon nanopillars strongly reduce front surface reflection over a broad wavelength range. In this study, we numerically simulate the reflection of light for thick crystalline silicon substrates nanostructured through a combination of silica nanosphere lithography (SNL) and metal-assisted chemical etching (MaCE), producing ordered arrays of nanopillars with hexagonal periodicity. Using statistical methods, we show that the simulated measurements are in good agreement with the spectrophotometry measurements of the fabricated nanopillars.",
author = "Natasa Vulic and Choi, {Jea Young} and Christiana Honsberg and Stephen Goodnick",
year = "2015",
doi = "10.1557/opl.2015.548",
language = "English (US)",
volume = "1770",
pages = "31--36",
booktitle = "Emerging Silicon Science and Technology",
publisher = "Materials Research Society",

}

TY - GEN

T1 - Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics

AU - Vulic, Natasa

AU - Choi, Jea Young

AU - Honsberg, Christiana

AU - Goodnick, Stephen

PY - 2015

Y1 - 2015

N2 - Periodic arrays of low-aspect ratio silicon nanopillars strongly reduce front surface reflection over a broad wavelength range. In this study, we numerically simulate the reflection of light for thick crystalline silicon substrates nanostructured through a combination of silica nanosphere lithography (SNL) and metal-assisted chemical etching (MaCE), producing ordered arrays of nanopillars with hexagonal periodicity. Using statistical methods, we show that the simulated measurements are in good agreement with the spectrophotometry measurements of the fabricated nanopillars.

AB - Periodic arrays of low-aspect ratio silicon nanopillars strongly reduce front surface reflection over a broad wavelength range. In this study, we numerically simulate the reflection of light for thick crystalline silicon substrates nanostructured through a combination of silica nanosphere lithography (SNL) and metal-assisted chemical etching (MaCE), producing ordered arrays of nanopillars with hexagonal periodicity. Using statistical methods, we show that the simulated measurements are in good agreement with the spectrophotometry measurements of the fabricated nanopillars.

UR - http://www.scopus.com/inward/record.url?scp=84961680435&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84961680435&partnerID=8YFLogxK

U2 - 10.1557/opl.2015.548

DO - 10.1557/opl.2015.548

M3 - Conference contribution

VL - 1770

SP - 31

EP - 36

BT - Emerging Silicon Science and Technology

PB - Materials Research Society

ER -