Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics

Natasa Vulic; Jea Young Choi; Christiana Honsberg; Stephen Goodnick

doi:10.1557/opl.2015.548

Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics

Natasa Vulic, Jea Young Choi, Christiana Honsberg, Stephen Goodnick

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

2 Scopus citations

Abstract

Periodic arrays of low-aspect ratio silicon nanopillars strongly reduce front surface reflection over a broad wavelength range. In this study, we numerically simulate the reflection of light for thick crystalline silicon substrates nanostructured through a combination of silica nanosphere lithography (SNL) and metal-assisted chemical etching (MaCE), producing ordered arrays of nanopillars with hexagonal periodicity. Using statistical methods, we show that the simulated measurements are in good agreement with the spectrophotometry measurements of the fabricated nanopillars.

Original language	English (US)
Title of host publication	Emerging Silicon Science and Technology
Editors	Rueben Collins, Zachary Holman, Akira Terakawa, Paul Stradins, Bahman Hekmatshoar
Publisher	Materials Research Society
Pages	31-36
Number of pages	6
ISBN (Electronic)	9781510826267
DOIs	https://doi.org/10.1557/opl.2015.548
State	Published - 2015
Event	2015 MRS Spring Meeting - San Francisco, United States Duration: Apr 6 2015 → Apr 10 2015

Publication series

Name	Materials Research Society Symposium Proceedings
Volume	1770
ISSN (Print)	0272-9172

Other

Other	2015 MRS Spring Meeting
Country/Territory	United States
City	San Francisco
Period	4/6/15 → 4/10/15

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

Access to Document

10.1557/opl.2015.548

Cite this

Vulic, N., Choi, J. Y., Honsberg, C., & Goodnick, S. (2015). Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics. In R. Collins, Z. Holman, A. Terakawa, P. Stradins, & B. Hekmatshoar (Eds.), Emerging Silicon Science and Technology (pp. 31-36). (Materials Research Society Symposium Proceedings; Vol. 1770). Materials Research Society. https://doi.org/10.1557/opl.2015.548

Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics. / Vulic, Natasa; Choi, Jea Young; Honsberg, Christiana et al.
Emerging Silicon Science and Technology. ed. / Rueben Collins; Zachary Holman; Akira Terakawa; Paul Stradins; Bahman Hekmatshoar. Materials Research Society, 2015. p. 31-36 (Materials Research Society Symposium Proceedings; Vol. 1770).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Vulic, N, Choi, JY, Honsberg, C & Goodnick, S 2015, Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics. in R Collins, Z Holman, A Terakawa, P Stradins & B Hekmatshoar (eds), Emerging Silicon Science and Technology. Materials Research Society Symposium Proceedings, vol. 1770, Materials Research Society, pp. 31-36, 2015 MRS Spring Meeting, San Francisco, United States, 4/6/15. https://doi.org/10.1557/opl.2015.548

Vulic N, Choi JY, Honsberg C , Goodnick S. Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics. In Collins R, Holman Z, Terakawa A, Stradins P, Hekmatshoar B, editors, Emerging Silicon Science and Technology. Materials Research Society. 2015. p. 31-36. (Materials Research Society Symposium Proceedings). doi: 10.1557/opl.2015.548

Vulic, Natasa ; Choi, Jea Young ; Honsberg, Christiana et al. / Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics. Emerging Silicon Science and Technology. editor / Rueben Collins ; Zachary Holman ; Akira Terakawa ; Paul Stradins ; Bahman Hekmatshoar. Materials Research Society, 2015. pp. 31-36 (Materials Research Society Symposium Proceedings).

@inproceedings{98a538a0f9bc4320995f297175aa3013,

title = "Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics",

abstract = "Periodic arrays of low-aspect ratio silicon nanopillars strongly reduce front surface reflection over a broad wavelength range. In this study, we numerically simulate the reflection of light for thick crystalline silicon substrates nanostructured through a combination of silica nanosphere lithography (SNL) and metal-assisted chemical etching (MaCE), producing ordered arrays of nanopillars with hexagonal periodicity. Using statistical methods, we show that the simulated measurements are in good agreement with the spectrophotometry measurements of the fabricated nanopillars.",

author = "Natasa Vulic and Choi, {Jea Young} and Christiana Honsberg and Stephen Goodnick",

note = "Publisher Copyright: {\textcopyright} 2015 Materials Research Society.; 2015 MRS Spring Meeting ; Conference date: 06-04-2015 Through 10-04-2015",

year = "2015",

doi = "10.1557/opl.2015.548",

language = "English (US)",

series = "Materials Research Society Symposium Proceedings",

publisher = "Materials Research Society",

pages = "31--36",

editor = "Rueben Collins and Zachary Holman and Akira Terakawa and Paul Stradins and Bahman Hekmatshoar",

booktitle = "Emerging Silicon Science and Technology",

}

TY - GEN

T1 - Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics

AU - Vulic, Natasa

AU - Choi, Jea Young

AU - Honsberg, Christiana

AU - Goodnick, Stephen

PY - 2015

Y1 - 2015

N2 - Periodic arrays of low-aspect ratio silicon nanopillars strongly reduce front surface reflection over a broad wavelength range. In this study, we numerically simulate the reflection of light for thick crystalline silicon substrates nanostructured through a combination of silica nanosphere lithography (SNL) and metal-assisted chemical etching (MaCE), producing ordered arrays of nanopillars with hexagonal periodicity. Using statistical methods, we show that the simulated measurements are in good agreement with the spectrophotometry measurements of the fabricated nanopillars.

AB - Periodic arrays of low-aspect ratio silicon nanopillars strongly reduce front surface reflection over a broad wavelength range. In this study, we numerically simulate the reflection of light for thick crystalline silicon substrates nanostructured through a combination of silica nanosphere lithography (SNL) and metal-assisted chemical etching (MaCE), producing ordered arrays of nanopillars with hexagonal periodicity. Using statistical methods, we show that the simulated measurements are in good agreement with the spectrophotometry measurements of the fabricated nanopillars.

UR - http://www.scopus.com/inward/record.url?scp=84961680435&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84961680435&partnerID=8YFLogxK

U2 - 10.1557/opl.2015.548

DO - 10.1557/opl.2015.548

M3 - Conference contribution

AN - SCOPUS:84961680435

T3 - Materials Research Society Symposium Proceedings

SP - 31

EP - 36

BT - Emerging Silicon Science and Technology

A2 - Collins, Rueben

A2 - Holman, Zachary

A2 - Terakawa, Akira

A2 - Stradins, Paul

A2 - Hekmatshoar, Bahman

PB - Materials Research Society

T2 - 2015 MRS Spring Meeting

Y2 - 6 April 2015 through 10 April 2015

ER -

Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics

Abstract

Publication series

Other

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this