Abstract

Periodic arrays of low-aspect ratio silicon nanopillars strongly reduce front surface reflection over a broad wavelength range. In this study, we numerically simulate the reflection of light for thick crystalline silicon substrates nanostructured through a combination of silica nanosphere lithography (SNL) and metal-assisted chemical etching (MaCE), producing ordered arrays of nanopillars with hexagonal periodicity. Using statistical methods, we show that the simulated measurements are in good agreement with the spectrophotometry measurements of the fabricated nanopillars.

Original languageEnglish (US)
Title of host publicationEmerging Silicon Science and Technology
PublisherMaterials Research Society
Pages31-36
Number of pages6
Volume1770
ISBN (Electronic)9781510826267
DOIs
StatePublished - 2015
Event2015 MRS Spring Meeting - San Francisco, United States
Duration: Apr 6 2015Apr 10 2015

Other

Other2015 MRS Spring Meeting
CountryUnited States
CitySan Francisco
Period4/6/154/10/15

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ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Vulic, N., Choi, J. Y., Honsberg, C., & Goodnick, S. (2015). Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics. In Emerging Silicon Science and Technology (Vol. 1770, pp. 31-36). Materials Research Society. https://doi.org/10.1557/opl.2015.548