Abstract

Periodic arrays of low-aspect ratio silicon nanopillars strongly reduce front surface reflection over a broad wavelength range. In this study, we numerically simulate the reflection of light for thick crystalline silicon substrates nanostructured through a combination of silica nanosphere lithography (SNL) and metal-assisted chemical etching (MaCE), producing ordered arrays of nanopillars with hexagonal periodicity. Using statistical methods, we show that the simulated measurements are in good agreement with the spectrophotometry measurements of the fabricated nanopillars.

Original languageEnglish (US)
Title of host publicationEmerging Silicon Science and Technology
EditorsRueben Collins, Zachary Holman, Akira Terakawa, Paul Stradins, Bahman Hekmatshoar
PublisherMaterials Research Society
Pages31-36
Number of pages6
ISBN (Electronic)9781510826267
DOIs
StatePublished - 2015
Event2015 MRS Spring Meeting - San Francisco, United States
Duration: Apr 6 2015Apr 10 2015

Publication series

NameMaterials Research Society Symposium Proceedings
Volume1770
ISSN (Print)0272-9172

Other

Other2015 MRS Spring Meeting
Country/TerritoryUnited States
CitySan Francisco
Period4/6/154/10/15

ASJC Scopus subject areas

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Fingerprint

Dive into the research topics of 'Silica nanosphere lithography defined light trapping structures for ultra-thin si photovoltaics'. Together they form a unique fingerprint.

Cite this