Sheet resistance measurement of non-standard cleanroom materials using suspended Greek cross test structures

Stefan Enderling, Charles L. Brown, Stewart Smith, Martin H. Dicks, J. Tom M Stevenson, Maria Mitkova, Michael Kozicki

Research output: Contribution to journalArticle

36 Citations (Scopus)

Abstract

This paper presents work on the development, fabrication and characterization of a suspended Greek cross measurement platform that can be used to determine the sheet resistance of materials that would contaminate Complementary Metal Oxide Semiconductor (CMOS) processing lines. The arms of the test structures are made of polysilicon/silicon nitride (Si 3N 4) to provide a carrier for the film to be evaluated and thick aluminum (Al) probe pads for multiple probing. The film to be evaluated is simply blanket deposited onto the structures and because of its design automatically forms a Greek cross structure with (Al) probe pads. To demonstrate its use, 1) gold (Au), 2) copper (Cu), and 3) silver (Ag) loaded chalcogenide glass Ag Y(Ge 30Se 70) 1-y have been blanket evaporated in various thicknesses onto the platform in the last processing step and autopatterned by the predefined shape of the Greek crosses. The suspension of the platform ensured electrical isolation between the test structure and the surrounding silicon (Si) substrate. The extracted effective resistivity for Au (5.1 × 10 -8 Ω · m), Cu (1.8- 2.5 × 10 -8 Ω · m) and Ag y(Ge 30Se 70) 1-y (2.27 × 10 -5 Ω · m - 1.88 Ω · m) agree with values found in articles in the Journal of Applied Physics (1963), the Journal of Physics D: Applied Physics (1976), and the Journal of Non-Crystalline Solids (2003). These results demonstrate that the proposed Greek cross platform is fully capable to measure the sheet resistance of low (Au, Cu) and high Ag y(Ge 30Se 70) 1-y resistive materials.

Original languageEnglish (US)
Pages (from-to)2-9
Number of pages8
JournalIEEE Transactions on Semiconductor Manufacturing
Volume19
Issue number1
DOIs
StatePublished - Feb 2006

Fingerprint

Sheet resistance
Physics
platforms
Silicon
Aluminum
blankets
Noncrystalline solids
physics
Processing
aluminum
Silicon nitride
Silver
Polysilicon
Gold
probes
Copper
Suspensions
silicon
Metals
silicon nitrides

Keywords

  • Critical dimension metrology
  • Greek cross
  • Non-standard cleanroom materials
  • Self patterning
  • Sheet resistance
  • Test structure
  • Van der pauw

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Industrial and Manufacturing Engineering
  • Physics and Astronomy (miscellaneous)
  • Condensed Matter Physics

Cite this

Sheet resistance measurement of non-standard cleanroom materials using suspended Greek cross test structures. / Enderling, Stefan; Brown, Charles L.; Smith, Stewart; Dicks, Martin H.; Stevenson, J. Tom M; Mitkova, Maria; Kozicki, Michael.

In: IEEE Transactions on Semiconductor Manufacturing, Vol. 19, No. 1, 02.2006, p. 2-9.

Research output: Contribution to journalArticle

Enderling, Stefan ; Brown, Charles L. ; Smith, Stewart ; Dicks, Martin H. ; Stevenson, J. Tom M ; Mitkova, Maria ; Kozicki, Michael. / Sheet resistance measurement of non-standard cleanroom materials using suspended Greek cross test structures. In: IEEE Transactions on Semiconductor Manufacturing. 2006 ; Vol. 19, No. 1. pp. 2-9.
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