Proton irradiation produces both ionization and displacement damage in semiconductor devices. In this paper, a technique for separating the effects of these two types of damage using a lateral PNP bipolar transistor with a gate contact over the active base region is described. By biasing the gate appropriately, the effects of ionization-induced damage are minimized and the effects of displacement damage can be measured independently. Experiments and simulations are used to validate this approach and provide insight into proton-induced BJT degradation.
ASJC Scopus subject areas
- Nuclear and High Energy Physics
- Nuclear Energy and Engineering
- Electrical and Electronic Engineering