Sensitivity of ellipsometric modeling to the "islands" of silicon precipitates at the bottom of the buried oxdde layer in annealed SIMOX

D. Chandler-Horowitz, J. F. Marchiando, M. Doss, S. Krause, S. Visitserngtrakul

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Fingerprint Dive into the research topics of 'Sensitivity of ellipsometric modeling to the "islands" of silicon precipitates at the bottom of the buried oxdde layer in annealed SIMOX'. Together they form a unique fingerprint.