Sensitivity of ellipsometric modeling to the "islands" of silicon precipitates at the bottom of the buried oxdde layer in annealed SIMOX

D. Chandler-Horowitz, J. F. Marchiando, M. Doss, S. Krause, S. Visitserngtrakul

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Chemical Compounds

Engineering & Materials Science