Secondary ion yield matrix effects in SIMS depth profiles of Si/Ge multilayers

Chemical Compounds

• Secondary Ion 84%
• Positive Secondary Ion 73%
• Secondary Ion Mass Spectroscopy 72%
• Multilayer 59%
• Auger Electron Spectroscopy 50%
• Sample Preparation 37%
• Negative Secondary Ion 36%
• Depth Profiling 27%
• Reaction Yield 27%
• Ion Beam 24%
• Dioxygen 21%
• Liquid Film 10%

Engineering & Materials Science

• Secondary ion mass spectrometry 100%
• Multilayers 64%
• Ions 61%
• Auger electron spectroscopy 34%
• Depth profiling 18%
• Oxygen 17%
• Silicon 17%
• Ion beams 15%

Physics & Astronomy

• secondary ion mass spectrometry 68%
• bombardment 41%
• matrices 36%
• profiles 36%
• ions 31%
• Auger spectroscopy 22%
• electron spectroscopy 21%
• preparation 16%
• oxygen 13%
• silicon 11%
• ion beams 8%
• shift 6%