Secondary electron emission of chemical-vapor-deposited diamond by impact of slow H +, D +, H 2 +, C +, O +, and O 2 ++ ions

M. Wieser, P. Wurz, Robert Nemanich, S. A. Fuselier

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

We report on the measurements of the secondary electron yield of chemical-vapor-deposited diamond upon the reflection of primary H+, D+, H2+, C+, O+, and O2+ ions in an energy range of 50-1000 eV per atom at a 60° angle of incidence to the surface normal. Depending on the species and energy, a secondary electron yield between 0.1 and 2 was observed and remained unchanged over weeks without further periodic reconditioning of the surface and in spite of the moderate vacuum environment of 10-7 mbar. Semiempirical fit functions were found with a dependence on the inverse velocity and the square root of the atomic number of the projectiles.

Original languageEnglish (US)
Article number034906
JournalJournal of Applied Physics
Volume98
Issue number3
DOIs
StatePublished - Aug 1 2005
Externally publishedYes

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secondary emission
electron emission
diamonds
vapors
projectiles
ions
electrons
incidence
vacuum
energy
atoms

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

Cite this

Secondary electron emission of chemical-vapor-deposited diamond by impact of slow H +, D +, H 2 +, C +, O +, and O 2 ++ ions. / Wieser, M.; Wurz, P.; Nemanich, Robert; Fuselier, S. A.

In: Journal of Applied Physics, Vol. 98, No. 3, 034906, 01.08.2005.

Research output: Contribution to journalArticle

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